Substrate handler, lithographic apparatus and device manufacturing method
First Claim
1. A substrate handler comprising:
- a support configured to receive a substrate on a support surface;
a conditioning device configured to condition said substrate through the support surface;
a float device configured to provide an air bed above the support surface, said float device configured to float said substrate on said air bed during conditioning of said substrate; and
a displacing device configured to displace said substrate, during the conditioning process, from one conditioning position to one or more other conditioning positions.
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Abstract
Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
15 Citations
19 Claims
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1. A substrate handler comprising:
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a support configured to receive a substrate on a support surface; a conditioning device configured to condition said substrate through the support surface; a float device configured to provide an air bed above the support surface, said float device configured to float said substrate on said air bed during conditioning of said substrate; and a displacing device configured to displace said substrate, during the conditioning process, from one conditioning position to one or more other conditioning positions. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A substrate handler for handling a substrate, comprising:
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a support configured to receive the substrate on a support surface; a conditioning device configured to thermally condition said substrate; and a float device configured to provide an air bed above the support surface of said substrate handler, said float device configured to float said substrate on said air bed during thermal conditioning of said substrate through the support surface; and a displacing device configured to displace said substrate, during the conditioning process, from one conditioning position to one or more other conditioning positions. - View Dependent Claims (9)
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10. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam; an array of individually controllable elements configured to modulate a cross-section of the radiation beam; a substrate table constructed to support a substrate; a projection system configured to project the modulated radiation beam onto a target portion of the substrate supported on said substrate table, and a substrate handler configured to load a substrate on said substrate table, the substrate handler comprising; a support configured to receive the substrate on a support surface; a conditioning device configured to thermally condition said substrate on the support surface; and a displacing device configured to displace said substrate relative to the support surface in a direction substantially parallel to said support surface, during the conditioning process, from one conditioning position to one or more other conditioning positions.
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11. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam; an array of individually controllable elements configured to modulate a cross-section of the radiation beam; a substrate table constructed to support a substrate; a projection system configured to project the modulated radiation beam onto a target portion of the substrate supported on said substrate table, and a substrate handler configured to load a substrate on said substrate table, the substrate handler comprising; a support configured to receive the substrate on a support surface; a conditioning device configured to thermally condition said substrate; and a float device configured to provide an air bed above the support surface, said float device configured to float said substrate on said air bed during thermal conditioning of said substrate through the support surface.
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12. A method for manufacturing a device comprising:
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thermally conditioning a substrate supported on a support surface of a substrate handler, the thermal conditioning being performed through the support surface; floating said substrate on an air bed above said support surface during conditioning of said substrate; and displacing said substrate, during the conditioning process, from one conditioning position to one or more other conditioning positions. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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Specification