Three-axis accelerometers

• US 7,578,189 B1
• Filed: 05/10/2006
• Issued: 08/25/2009
• Est. Priority Date: 05/10/2006
• Status: Active Grant

• Current Assignee: Panasonic Corporation (Panasonic Holdings Corporation)
• Original Assignee: Qualtre Incorporated (Panasonic Holdings Corporation)
• Inventors: Mehregany, Mehran
• Primary Examiner(s): CHAPMAN JR, JOHN E
• Application Number:
  US11/431,168
• Time in Patent Office: 1,203 Days
• Field of Search: 735/141.8, 735/143.2
• US Class Current: 73/514.18
• CPC Class Codes: B81B 2201/0235 Accelerometers
• CPC Class Codes: B81C 1/00182 Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer
• CPC Class Codes: B81C 2201/0111 Bulk micromachining
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 15/131 with electrostatic counterbalancing means
• CPC Class Codes: G01P 15/18 in two or more dimensions
• CPC Class Codes: G01P 2015/084 the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
• CPC Class Codes: Y10T 29/49156 with selective destruction of conductive paths

Abstract

Disclosed are MEMS accelerometers and methods for fabricating same. An exemplary accelerometer comprises a substrate, and a proof mass that is a portion of the substrate and which is separated from the substrate surrounding it by a gap. An electrically-conductive anchor is coupled to the proof mass, and a plurality of electrically-conductive suspension arms that are separated from the proof mass extend from the anchor and are coupled to the substrate surrounding the proof mass. A plurality of sense and actuation electrodes are separated from the proof mass by gaps and are coupled to processing electronics. Capacitive sensing is used to derive electrical signals caused by forces exerted on the proof mass, and the electrical signals are processed by the processing electronics to produce x-, y- and z-direction acceleration data. Electrostatic actuation is used to induce movements of the mass for force balance operation, or self-test and self-calibration. The fabrication methods use deep reactive ion etch bulk micromachining and surface micromachining to form the proof mass, suspension arms and electrodes. The anchor, suspension arms and electrodes are made in the same process steps from the same electrically conductive material, which is different from the substrate material.

Claims

1. Apparatus, comprising:

a substrate;

a proof mass comprising a portion of the substrate and that is separated from the substrate surrounding the proof mass by a gap; and

a structural layer anchored to the proof mass and to the substrate that comprises a mechanical suspension and a plurality of sense and actuation electrodes separated from the proof mass by gaps.

2. The apparatus recited in claim 1 wherein the structural layer comprises:

at least one electrically-conductive anchor coupled to the proof mass; and

at least one electrically-conductive suspension arm that is separated from the proof mass, and that extends from the anchor and is connected to the substrate.

3. The apparatus recited in claim 2 wherein the electrically-conductive anchor is coupled to the proof mass at a top center of the proof mass.

4. The apparatus recited in claim 2 further comprising at least one bond pad respectively coupled to the at least one electrically-conductive suspension arm.

5. The apparatus recited in claim 2 wherein a plurality of transverse suspension arms extend along x and y axes of the apparatus, and the proof mass extends from the anchor along the z axis of the apparatus.

6. The apparatus recited in claim 2 wherein the anchor and at least one suspension arm comprise a semiconductor material.

7. The apparatus recited in claim 2 wherein the anchor and at least one suspension arm comprise metal.

8. The apparatus recited in claim 2 wherein the anchor and at least one suspension arm comprise doped polysilicon.

9. The apparatus recited in claim 2 wherein the anchor, at least one suspension arm and sense and actuation electrodes comprise doped polysilicon.

10. The apparatus recited in claim 1 wherein the substrate comprises a semiconductor substrate.

11. The apparatus recited in claim 1 wherein the substrate comprises a silicon substrate.

12. The apparatus recited in claim 1 wherein the substrate comprises a semiconductor-on-insulator substrate.

13. The apparatus recited in claim 1 wherein the substrate comprises a metal in which deep trenches may be fabricated by reactive ion etching.

14. The apparatus recited in claim 1 wherein the sense and actuation electrodes are coupled to bond pads.

15. The apparatus recited in claim 14 wherein the sense and actuation electrodes and bond pads comprise an electrically-conductive material.

16. The apparatus recited in claim 14 wherein the sense and actuation electrodes and bond pads comprise doped polysilicon.

17. The apparatus recited in claim 1 wherein the sense and actuation electrodes comprise at least one capacitive sensing electrode and at least one electrostatic actuation electrode, respectively.

18. The apparatus recited in claim 1 wherein the sense electrodes are coupled to processing circuitry that is operative to process electrical signals sensed by the sense electrodes in response to movement of the proof mass, and wherein processing of the signals derived from the sense electrodes allows determination of the acceleration components along the respective axes of the apparatus.

19. The apparatus recited in claim 1 wherein the actuation electrodes are coupled to processing circuitry that is operative to process electrical signals that induce controlled movements of the proof mass.

20. The apparatus recited in claim 1 wherein the actuation electrodes are coupled to processing circuitry that is operative to process electrical signals that induce controlled movements of the proof mass, and wherein processing of the signals derived from the sense electrodes allows determination of the actuation force components along the respective axes of the apparatus.

21. The apparatus recited in claim 1 wherein the substrate is attached to a packaging substrate, and wherein the proof mass is recessed from the packaging substrate.

22. The apparatus recited in claim 21 wherein the packaging substrate comprises sensing and actuation electrodes disposed under the proof mass.

23. The apparatus recited in claim 21 wherein the sensing and actuation electrodes are separated from the proof mass by gaps.