Method of patterning a film
First Claim
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1. A method of patterning a film comprising:
- forming a hard mask above a film to be patterned;
etching said film in alignment with said hard mask to form a patterned film having a pair of laterally opposite sidewalls;
forming a protective layer on said pair of laterally opposite sidewalls;
after forming said protective layer, removing said hard mask from above said patterned film; and
after removing said hard mask from said patterned film, removing said protective layer from said sidewalls.
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Abstract
A method of patterning a thin film. The method includes forming a mask on a film to be patterned. The film is then etched in alignment with the mask to form a patterned film having a pair of laterally opposite sidewalls. A protective layer is formed on the pair of laterally opposite sidewalls. Next, the mask is removed from above the patterned film. After removing the mask from the patterned film, the protective layer is removed from the sidewalls.
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Citations
32 Claims
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1. A method of patterning a film comprising:
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forming a hard mask above a film to be patterned; etching said film in alignment with said hard mask to form a patterned film having a pair of laterally opposite sidewalls; forming a protective layer on said pair of laterally opposite sidewalls; after forming said protective layer, removing said hard mask from above said patterned film; and after removing said hard mask from said patterned film, removing said protective layer from said sidewalls. - View Dependent Claims (2, 3)
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4. A method of patterning a film comprising:
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forming a mask above a monocrystalline silicon film to be patterned; etching said monocrystalline silicon film in alignment with said mask to form a patterned monocrystalline silicon film having a pair of laterally opposite sidewalls; forming a protective layer on said pair of laterally opposite sidewalls; after forming said protective layer, removing said mask from above said patterned monocrystalline silicon film; and after removing said mask from said patterned monocrystalline silicon film, removing said protective layer from said sidewalk. - View Dependent Claims (5, 6, 7, 8)
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9. A method of patterning a semiconductor film comprising:
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forming a masking layer above a semiconductor film formed on a substrate; patterning said masking layer into a mask; etching said semiconductor film in alignment with said mask to form a semiconductor body having a pair of laterally opposite sidewalls; forming a protective layer on said sidewalls of said semiconductor body; after forming said protective layer, removing said mask from above said semiconductor body; after removing said mask from said semiconductor body, removing said protective layer on said sidewalls of said semiconductor body; and wherein said mask is a silicon nitride or silicon oxynitride film and wherein said mask is removed utilizing a wet etchant comprising phosphoric acid and DI water.
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10. A method of patterning a semiconductor film comprising:
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forming a masking layer above a semiconductor film formed on a substrate; patterning said masking layer into a mask; etching said semiconductor film in alignment with said mask to form a semiconductor body having a pair of laterally opposite sidewalls; forming a protective layer on Said sidewalls of said semiconductor body; after forming said protective layer, removing said mask from above said semiconductor body; after removing said mask from said semiconductor body, removing said protective layer on said sidewalls of said semiconductor body; and wherein said semiconductor film is a doped single crystalline silicon film. - View Dependent Claims (11, 12, 13, 14)
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15. A method of patterning a semiconductor film comprising:
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forming a masking layer above a semiconductor film formed on a substrate; patterning said masking layer into a mask; etching said semiconductor film in alignment with said mask to form a semiconductor body having a pair of laterally opposite sidewalls; forming a protective layer on said sidewalls of said semiconductor body; after forming said protective layer, removing said mask from above said semiconductor body; after removing said mask from said semiconductor body, removing said protective layer on said sidewalk of said semiconductor body; and forming a gate dielectric layer on said sidewalls of said semiconductor body and forming a gate electrode over and around said semiconductor body and adjacent to said gate dielectric layer on said sidewalls of said semiconductor body.
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16. A method of forming a nonplanar transistor comprising:
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doping a single crystalline silicon film formed on a substrate; forming a silicon nitride layer over said doped single crystalline silicon film; patterning said silicon nitride layer into a silicon nitride hard mask; etching said doped single crystalline silicon film in alignment with said silicon nitride hard mask to define a doped single crystalline silicon body having a pair of laterally opposite sidewalls; growing a silicon dioxide film on said sidewalls of said doped single crystalline silicon film; removing said silicon nitride hard mask from above said doped single crystalline silicon body; after removing said silicon nitride hard mask, removing said silicon dioxide film from said sidewalls of said doped single crystalline silicon body; forming a gate dielectric layer on said pair of laterally opposite sidewalls and on the top surface of said doped single crystalline silicon body; forming a gate electrode on said gate dielectric layer on said top surface of said doped single crystalline silicon body and adjacent to said gate dielectric layer on said sidewalls of said doped single crystalline silicon body; and forming a pair of source/drain regions in said single crystalline silicon body on opposite sides of said gate electrode. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25)
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- 26. The method of claim l6 wherein prior to forming said masking layer above said doped single crystalline silicon film, a silicon dioxide film is grown on said doped single crystalline silicon film and wherein said hard mask is formed on said silicon dioxide film grown on said doped single crystalline silicon film.
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28. A method of patterning a film comprising:
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forming a masking material on a film to be patterned; patterning said masking material into a mask; etching said film with a first etchant which etches said film without significantly etching said masking material to form a patterned film having a pair of laterally opposite sidewalls; after forming said patterned films, selectively forming a passivation layer on said sidewalls of said patterned film; and removing said mask with a second etchant which does not significantly etch said passivation layer on said sidewalls, wherein said second etchant is capable of etching said film. - View Dependent Claims (29, 30, 32)
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31. A method of patterning a film comprising:
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forming a masking material on a film to be patterned; patterning said masking material into a mask utilizing a patterned photoresist film; removing said patterned photoresist film; etching said film with a first etchant which etches said film without significantly etching said masking material to form a patterned film having a pair of laterally opposite sidewalls; after forming said patterned film, forming a passivation layer on said sidewalls of said patterned film; and removing said mask with a second etchant which does not significantly etch said passivation layer on said sidewalls, wherein said second etchant is capable of etching said film.
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Specification