Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout

• US 7,584,450 B2
• Filed: 12/12/2006
• Issued: 09/01/2009
• Est. Priority Date: 02/17/2006
• Status: Active Grant

• Current Assignee: Synopsys Incorporated
• Original Assignee: Synopsys Incorporated
• Inventors: Fang, Weiping, Song, Hua, Zhang, Daniel N., Kim, Juhwan, Tang, Zong Wu, Melvin, Lawrence S. III
• Primary Examiner(s): Levin; Naum B
• Application Number:
  US11/637,424
• Publication Number:
  US 20070198958A1
• Time in Patent Office: 994 Days
• Field of Search: 716 4- 6, 716 19- 21, 713/13, 713/14
• US Class Current: 716/52
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G05B 2219/45031 Manufacturing semiconductor wafers
• CPC Class Codes: G06F 2119/18 Manufacturability analysis or optimisation for manufacturability
• CPC Class Codes: G06F 30/398 Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM] optical proximity correction [OPC] design processes G03F1/36
• CPC Class Codes: Y02P 90/02 Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Abstract

One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout'"'"'s geometry within a first ambit of the first check-figure, wherein the first sample'"'"'s geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.

Claims

1. A method for using a database to quickly identify a manufacturing problem area in a layout, the method comprising:

using at least one computer to;

determining a first sample in proximity to a first location in a first layout, wherein the first sample represents the first layout'"'"'s geometry within an ambit of the first location, wherein the first sample'"'"'s geometry is expected to affect the shape of a first feature;

performing a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems;

storing the first simulation-result in a database;

determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout'"'"'s geometry within an ambit of the second location, and wherein the second sample'"'"'s geometry is expected to affect the shape of a second feature;

querying the database to determine if the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry; and

in response to determining that that second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry, using the first simulation-result to generate an indicator which indicates whether the second feature is expected to have manufacturing problems.

2. The method of claim 1, wherein performing the model-based simulation involves convolving a process model with the first sample.

3. The method of claim 1, wherein prior to determining the first sample, the method comprises:

identifying a polygon'"'"'s edge which is susceptible to manufacturing problems; and

selecting a location on the polygon'"'"'s edge to be the first location.

4. The method of claim 1, wherein storing the first simulation-result involves:

generating a first identifier using the first sample'"'"'s geometry; and

storing the first identifier and the first simulation-result in the database so that the first simulation-result can be queried using the first identifier.

5. The method of claim 4, further comprising:

determining a first proximity-correction using the first sample in response to determining that the first feature is expected to have manufacturing problems; and

storing the first proximity-correction in the database so that the first proximity-correction can be queried using the first identifier.

6. The method of claim 5, further comprising using the database to apply the first proximity-correction to the second sample by:

generating a second identifier using the second sample'"'"'s geometry;

querying the database using the second identifier to determine whether the first sample'"'"'s geometry is substantially similar to the second sample'"'"'s geometry; and

in response to determining that the first sample'"'"'s geometry is substantially similar to the second sample'"'"'s geometry, applying the first proximity-correction to the second sample.

7. A method for using a database to quickly perform proximity correction on a layout, the method comprising:

using at least one computer to;

associating via the database a first sample in proximity to a first location in a first layout with a first proximity-correction, and wherein the first sample represents a portion of the first layout which is expected to cause manufacturing problems with a first feature;

determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout'"'"'s geometry within an ambit of the second location, wherein the second sample'"'"'s geometry is expected to affect the shape of a second feature; and

using the database to quickly perform proximity correction on the second sample by;

querying the database using the second sample to determine whether the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry; and

in response to determining that the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry, applying the first proximity correction to the second sample.

8. A computer-readable storage device storing instructions that when executed by a computer cause the computer to perform a method for using a database to quickly identify a manufacturing problem area in a layout, the method comprising:

determining a first sample in proximity to a first location in a first layout, wherein the first sample represents the first layout'"'"'s geometry within an ambit of the first location, wherein the first sample'"'"'s geometry is expected to affect the shape of a first feature;

performing a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems;

storing the first simulation-result in a database;

determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout'"'"'s geometry within an ambit of the second location, and wherein the second sample'"'"'s geometry is expected to affect the shape of a second feature;

querying the database to determine if the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry; and

in response to determining that that second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry, using the first simulation-result to generate an indicator which indicates whether the second feature is expected to have manufacturing problems.

9. The computer-readable storage device of claim 8, wherein performing the model-based simulation involves convolving a process model with first sample.

10. The computer-readable storage device of claim 8, wherein prior to determining the first sample, the method comprises:

identifying a polygon'"'"'s edge which is susceptible to manufacturing problems; and

selecting a location on the polygon'"'"'s edge to be the first location.

11. The computer-readable storage device of claim 8, wherein storing the first simulation-result involves:

generating a first identifier using the first sample'"'"'s geometry; and

storing the first identifier and the first simulation-result in the database so that the first simulation-result can be queried using the first identifier.

12. The computer-readable storage device of claim 11, further comprising:

determining a first proximity-correction using the first sample in response to determining that the first feature is expected to have manufacturing problems; and

storing the first proximity-correction in the database so that the first proximity-correction can be queried using the first identifier.

13. The computer-readable storage device of claim 12, further comprising using the database to apply the first proximity-correction to the second sample by:

generating a second identifier using the second sample'"'"'s geometry;

querying the database using the second identifier to determine whether the first sample'"'"'s geometry is substantially similar to the second sample'"'"'s geometry; and

in response to determining that the first sample'"'"'s geometry is substantially similar to the second sample'"'"'s geometry, applying the first proximity-correction to the second sample.

14. A computer-readable storage device storing instructions that when executed by a computer cause the computer to perform a method for using a database to quickly perform proximity correction on a layout, the method comprising:

associating via the database a first sample in proximity to a first location in a first layout with a first proximity-correction, and wherein the first sample represents a portion of the first layout which is expected to cause manufacturing problems with a first feature;

determining a second sample in proximity to a second location in a second layout, wherein the second location is different from the first location, wherein the second sample represents the second layout'"'"'s geometry within an ambit of the second location, wherein the second sample'"'"'s geometry is expected to affect the shape of a second feature; and

using the database to quickly perform proximity correction on the second sample by;

querying the database using the second sample to determine whether the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry; and

in response to determining that the second sample'"'"'s geometry is substantially similar to the first sample'"'"'s geometry, applying the first proximity correction to the second sample.