Sensor with microelectro-mechanical oscillators

• US 7,584,649 B2
• Filed: 06/01/2007
• Issued: 09/08/2009
• Est. Priority Date: 06/02/2006
• Status: Expired due to Fees

• Current Assignee: The Board of Trustees of Michigan State University (Michigan State University), Regents of the University of California (University of California)
• Original Assignee: The Board of Trustees of Michigan State University (Michigan State University), Regents of the University of California (University of California)
• Inventors: Shaw, Steven W., DeMartini, Barry E, Turner, Kimberly L, Rhoads, Jeffrey F
• Primary Examiner(s): Rogers; David A.
• Application Number:
  US11/809,803
• Publication Number:
  US 20080110247A1
• Time in Patent Office: 830 Days
• Field of Search: 73 2401- 2406, 73 2801- 2804, 73 3101- 3105, 73/617.1, 73/617.5, 73/645.3
• US Class Current: 73/31.06
• CPC Class Codes: G01N 2291/0256 Adsorption, desorption, surface mass change, e.g. on biosensors
• CPC Class Codes: G01N 29/022 Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices microdevices per se B81B

Abstract

A sensor is provided which is configured to detect the presence of multiple analytes, for example chemical or biological compounds, through the measurement of induced resonance shifts in a coupled array of microelectromechanical or micromechanical resonators.

Claims

1. A sensor comprising:

a shuttle mass;

first and second masses vibrationally coupled to the shuttle mass, the first mass having a first resonant frequency in the absence of a first analyte, and a second resonant frequency after the exposure to the first analyte;

the second mass having a third resonant frequency in the absence of a second analyte, and a fourth resonant frequency after the exposure to the second analyte;

a vibration sensor configured to detect a response of the shuttle mass; and

an actuator configured to simultaneously drive the shuttle mass at a plurality of frequencies between a first predetermined frequency and a second predetermined frequency.

2. The sensor according to claim 1 wherein further comprising a circuit configured to detect changes in the response of the shuttle mass.

3. The sensor according to claim 1 wherein the vibration sensor comprises a plurality of charged members.

4. The sensor according to claim 1 wherein the actuator comprises a plurality of charged plates.

5. The sensor according to claim 1 wherein the first mass is a first cantilevered beam.

6. The sensor according to claim 5 wherein the second mass is a second cantilevered beam.

7. A sensor comprising:

a shuttle mass;

first and second beams vibrationally coupled to the shuttle mass, the first beam having a first resonant frequency in the absence of a first analyte, and a second resonant frequency after the exposure to the first analyte;

the second beam having a third resonant frequency in the absence of a second analyte, and a fourth resonant frequency after the exposure to the second analyte;

a vibration sensor configured to detect vibration of the shuttle mass;

an actuator configured to simultaneously drive the shuttle mass at a plurality of vibrational frequencies.

8. The sensor according to claim 7 wherein the actuator is configured to impart a first vibrational frequency to the shuttle mass.

9. The sensor according to claim 8 wherein the actuator is configured to impart a second vibrational frequency to the shuttle mass.

10. The sensor according to claim 7 wherein the first beam comprises a first material configured to absorb the first analyte.

11. The sensor according to claim 10 wherein the second beam comprises a second material configured to absorb the second analyte.

12. A sensor comprising:

a support mass vibrationally coupled to a base;

first and second beams vibrationally coupled to the support mass, the first beam having a first resonant frequency in the absence of a first analyte, and a second resonant frequency in the presense the first analyte;

the second beam having a third resonant frequency in the absence of a second analyte, and a fourth resonant frequency in the presence of the second analyte;

a vibration sensor configured to detect vibration of the support mass; and

an actuator configured to simultaneously drive the support mass at a plurality of frequencies.

13. The sensor according to claim 12 wherein the first beam comprises a first absorbing material and the second beam comprises a second absorbing material.

14. The sensor according to claim 12 wherein the actuator is configured to impart vibrational energy to the support mass.

15. The sensor according to claim 14 wherein the actuator is configured to impart a first frequency to the support mass.

16. The sensor according to claim 15 wherein the actuator is configured to impart a second frequency to the support mass.

17. A sensor comprising:

a support mass vibrationally coupled to a base;

first and second beams vibrationally coupled to the support mass, the first beam having a first resonant frequency in the absence of a first analyte, and a second resonant frequency in the presense the first analyte;

the second beam having a third resonant frequency in the absence of a second analyte, and a fourth resonant frequency in the presence of the second analyte;

a vibration sensor configured to detect vibration of the support mass; and

an actuator configured to drive the support mass, wherein the first beam comprises a first material configured to absorb the first analyte, and wherein the second beam comprises a second material configured to absorb the second analyte, and wherein the support mass is coupled to the base through the first and second beams.

18. The sensor according to claim 17 wherein the first material comprises a detection material selected from the group consisting of silicon, polycrystalline silicon, amorphous silicon, polycrystalline diamond, amorphous diamond, gallium arsenide, silicon nitride, silicon carbide, titanium, gold, aluminum, aluminum nitride, nickel, silicon dioxide, glass, chromium, photoresist, platinum, titanium oxide, and combinations thereof.

19. The sensor according to claim 17 wherein the first and second beams are cantilevered beams.

20. A sensor comprising:

a sensing element having at least two vibrating members, each with a respective first resonant frequency, wherein the vibrating members are configured to exhibit a change in vibration response the presence of a plurality of analytes;

a drive element coupled to the sensing element, said drive element configured to apply force to the sensing element to simultaneously induce a vibration at a plurality of frequencies within the sensing element; and

a sensor configured to measure changes of a resonant frequency of at least one of the vibrating members.

21. The sensor according to claim 20 wherein one of mass or stiffness of a vibrating member changes in the presence of an analyte.