Optical metrology model optimization based on goals
First Claim
1. A method for evaluating an optical metrology model for use in examining a wafer structure, the method comprising:
- a) defining an optical metrology model having metrology model variables, which includes profile model parameters of a profile model that characterizes the shape of the wafer structure to be examined;
b) selecting one or more goals for optimizing the optical metrology model;
c) measuring one or more profile model parameters using the optimized optical metrology model and a first metrology device, wherein the first metrology device is an optical metrology device;
d) measuring the one or more profile model parameters using a second metrology device;
e) calculating the one or more selected goals using the one or more profile model parameters measured using the first metrology device and the second metrology device; and
f) evaluating the optical metrology model based on the one or more selected goals calculated in e).
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Abstract
The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.
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Citations
23 Claims
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1. A method for evaluating an optical metrology model for use in examining a wafer structure, the method comprising:
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a) defining an optical metrology model having metrology model variables, which includes profile model parameters of a profile model that characterizes the shape of the wafer structure to be examined; b) selecting one or more goals for optimizing the optical metrology model; c) measuring one or more profile model parameters using the optimized optical metrology model and a first metrology device, wherein the first metrology device is an optical metrology device; d) measuring the one or more profile model parameters using a second metrology device; e) calculating the one or more selected goals using the one or more profile model parameters measured using the first metrology device and the second metrology device; and f) evaluating the optical metrology model based on the one or more selected goals calculated in e). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A system for evaluating an optical metrology model for use in examining a wafer structure, the system comprising:
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a model preprocessor configured to define an optical metrology model having metrology model variables, which includes profile model parameters of a profile model that characterizes the shape of the wafer structure to be examined; a first metrology device configured to measure one or more profile model parameters from the wafer structure using the optical metrology model and a first metrology device, wherein the first metrology device is an optical metrology device; a second metrology device configured to measure the one or more profile model parameters from the wafer structure; and a comparator configured to calculate one or more selected goals using the one or more profile model parameters measured using the first metrology device and the second metrology device, and to evaluating the optical metrology model based on the calculated one or more selected goals. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A computer-readable storage medium containing computer executable instructions to evaluate an optical metrology model for use in examining a wafer structure, comprising instructions for:
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a) defining an optical metrology model having metrology model variables, which includes profile model parameters of a profile model that characterizes the shape of the wafer structure to be examined; b) obtaining one or more selected goals for optimizing the optical metrology model; c) obtaining one or more profile model parameters measured using the optimized optical metrology model and a first metrology device, wherein the first metrology device is an optical metrology device; d) obtaining the one or more profile model parameters measured using a second metrology device; e) calculating the one or more selected goals using the one or more profile model parameters measured using the first metrology device and the second metrology device; and f) evaluating the optical metrology model based on the one or more selected goals calculated in e). - View Dependent Claims (21, 22, 23)
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Specification