Method and apparatus for producing plasma

• US 7,589,470 B2
• Filed: 01/31/2006
• Issued: 09/15/2009
• Est. Priority Date: 01/31/2006
• Status: Expired due to Fees

• Current Assignee: Dublin City University
• Original Assignee: Dublin City University
• Inventors: Ellingboe, Albert Rogers, Oksuz, Lutfi
• Primary Examiner(s): VO, TUYET THI
• Application Number:
  US11/343,682
• Publication Number:
  US 20070176709A1
• Time in Patent Office: 1,323 Days
• Field of Search: 315/39.3, 315/39.53, 315/39.55, 315/39.57, 315500-506, 315/39, 315/39.51, 315/39.77, 315/39.71, 315/39.63, 333/111, 333/110, 333/113, 333/114, 333/124, 333/32, 333/35, 333/34, 333/33, 333157-159, 333/99.PL, 333/242, 333/240, 333/239, 333/230, 333/227, 333/212, 333/81.B
• US Class Current: 315/39.71
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32201 Generating means
• CPC Class Codes: H01J 37/32211 Means for coupling power to the plasma
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: H05H 1/4622 using waveguides
• CPC Class Codes: H05H 1/463 using antennas or applicators

Abstract

A method and apparatus for producing a distributed plasma at atmospheric pressure. A distributed plasma can be produced at atmospheric pressure by using an inexpensive high frequency power source in communication with a waveguide having a plurality particularly configured couplers disposed therein. The plurality of particularly arranged couplers can be configured in the waveguide to enhance the electromagnetic field strength therein. The plurality of couplers have internal portions disposed inside the waveguide and spaced apart by a distance of ½ wavelength of the high frequency power source and external portions disposed outside the waveguide and spaced apart by a predetermined distance which is calculated to cause the electromagnetic fields in the external portions of adjacent couplers to couple and thereby further enhance the strength of the electromagnetic field in the waveguide. Plasma can be formed in plasma areas defined by gaps between electrodes disposed on the external portions.

Claims

1. A plasma generator comprising:

a high frequency power source in communication with a waveguide;

a plurality of couplers extending into said waveguide wherein said couplers include external portions comprising electrodes defining a plasma area therebetween, the electrodes being spaced apart by a distance selected to increase field strength in said plasma area.

2. The plasma generator according to claim 1 wherein said plurality of couplers include internal portions being spaced apart by a distance selected to be at or near the peak of the electromagnetic field of said high frequency energy strength in said waveguide.

3. The plasma generator according to claim 1 wherein the spacing between said internal portions is substantially different from the spacing between said external portions.

4. The plasma generator according to claim 1 wherein said plurality of couplers include internal portions being spaced apart by a distance of wavelength of said high frequency energy.

5. The plasma generator according to claim 4 wherein said couplers are adapted to couple to electric field portions of said high frequency energy.

6. The plasma generator according to claim 4 wherein said couplers are adapted to couple to magnetic field portion of said high frequency energy.

7. The plasma generator according to claim 1 wherein said high frequency power source provides energy at a frequency of greater than or equal to about 1 GHz.

8. The plasma generator according to claim 1 wherein said high frequency power source is a 2.45 GHz magnetron.

9. The plasma generator according to claim 1 wherein said waveguide is a Te10 mode rectangular waveguide.

10. The plasma generator according to claim 1 wherein said waveguide directs power through said couplers to the plasma area in communication therewith.

11. The plasma generator according to claim 10 wherein the plasma area contains a gas at about atmospheric pressure.

12. The plasma generator according to claim 1 wherein said plurality of couplers are arranged to form an array of electrodes defining a plasma area in gaps between said electrodes.

13. The plasma generator according to claim 12 wherein adjacent electrodes are 180 degrees out of phase with each other.

14. The plasma generator according to claim 11 wherein said application of power to said plasma area ionizes said gas to provide a substantially uniform distribution of plasma therein.

15. The plasma generator according to claim 11 further comprising:

a circulator in communication with said high frequency power source;

matched loads in communication with said circulator;

a directional coupler disposed between said circulator and said waveguide and adapted to prevent reflected power from damaging said high frequency power source.

16. The plasma generator according to claim 9 wherein said waveguide comprises a first and second end, wherein said first end is in communication with said high frequency power source and wherein said second end is short circuited.

17. The plasma generator according to claim 1 further comprising a second high frequency power source in communication with said waveguide, wherein said waveguide comprises a first end in communication with said (first) high frequency power source and a second end in communication with said second high frequency power source.

18. A plasma generator comprising:

a 2.45 GHz magnetron in communication with a circulator;

matched loads in communication with said circulator;

a directional coupler in communication with said circulator and adapted to prevent reflected power from damaging said 2.45 GHz magnetron;

a Te10 mode rectangular waveguide having a first end and a second end, wherein said first end is in communication with said directional coupler and receives microwave energy from said magnetron and said second end is short circuited such that a standing wave is formed in said waveguide;

a plurality of couplers having internal portions disposed inside said waveguide and external portions disposed outside of said waveguide, wherein said internal portions are spaced apart by a distance of ½

wavelength of said standing wave and placed relative to said second end such that each of said internal portions is aligned with a peak of said standing wave, said external portions comprises electrodes which are spaced apart such that electrical fields in adjacent external portions are coupled to enhance the field strength in the region between the external portions.

19. Plasma generating means comprising:

a high frequency power source in communication with waveguide means;

coupler means in communication with said waveguide means wherein said coupler means have internal portions aligned with peaks of a standing wave in said waveguide and external portions including electrodes disposed thereon and spaced apart by a distance chosen to enhance the electric field strength

in plasma areas formed along gaps between said electrodes.

20. A method of generating a distributed plasma comprising:

spacing internal portions of stubs in a waveguide to align said internal portions with peaks of a standing wave in said waveguide;

providing external portions comprising electrodes;

spacing external portions of said electrodes by a distance chosen to generate a distributed plasma in gaps between the electrodes and having an enhanced electric field strength in said gaps; and

applying high frequency power to said waveguide to generate said distributed plasma in said gaps between said electrodes which are disposed on said external portions.