Stage drive method and stage unit, exposure apparatus, and device manufacturing method

• US 7,589,822 B2
• Filed: 02/02/2004
• Issued: 09/15/2009
• Est. Priority Date: 02/02/2004
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/588,029
• Publication Number:
  US 20070127006A1
• Time in Patent Office: 2,052 Days
• Field of Search: 355/53, 355 72- 76, 355/30, 355/55
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: Y10T 29/49155 Manufacturing circuit on or in base

Abstract

When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

Claims

1. A stage drive method in which a first stage and a second stage are independently driven within an area in a two-dimensional plane of a predetermined range including a first area where liquid is locally supplied and a second area located on one side of the first area in a first axis direction, wherein

during a transition from a first state in which one stage of the first stage and the second stage is positioned at the first area to a second state in which the other stage is positioned at the first area, the first stage and the second stage are simultaneously driven in a second axis direction intersecting the first axis direction while one of a state where the first stage and the second stage are close together in the second axis direction and a state where the first stage and the second stage are in contact in the second axis direction is maintained.

2. The stage drive method of claim 1 wherein

the first stage and the second stage are separately driven by a set of linear actuators that can engage freely detachably to both the first stage and the second stage and each of which can drive a specific stage in an engaged state in at least the second axis direction, the specific stage being one of the first stage and the second stage, and

during the transition, one stage of the first stage and the second stage is in an engaged state with one linear actuator of the set of linear actuators and the other stage is in an engaged state with an other linear actuator, and after the transition, the engagement between both stages and the linear actuators are released respectively and then the one stage engages with the other linear actuator and the other stage engages with the one linear actuator.

3. The stage drive method of claim 1 wherein

during the transition, the liquid continues to be retained on the stage positioned at the first area.

4. The stage drive method of claim 1 wherein

measurement beams are irradiated on reflection surfaces of a first mirror and a second mirror, which are respectively arranged on the first stage and the second stage on a surface besides the surface on the side where both stages are close or are in contact during the transition, and the position of the first and second stages is controlled based on reflection beams from the reflection surfaces of the first mirror and the second mirror.

5. A stage unit comprising:

a first stage and a second stage that are independently driven within an area in a two-dimensional plane of a predetermined range, which includes a first area where liquid is locally supplied and a second area located on one side of the first area in a first axis direction; and

a control unit that controls the first stage and second stage so as to simultaneously move the first stage and the second stage in a second axis direction intersecting the first axis direction while one of a state where the first stage and the second stage are close together in the second axis direction and a state where the first stage and the second stage are in contact in the second axis direction is maintained, during a transition from a first state in which one stage of the first stage and the second stage is positioned at the first area to a second state in which the other stage is positioned at the first area.

6. An exposure apparatus that supplies a liquid to a space between a projection optical system and a substrate and exposes the substrate with an energy beam via the projection optical system and the liquid, the apparatus comprising:

a first stage that is movable within an area of a predetermined range including a first area directly below the projection optical system where the liquid is supplied and a second area located on one side of the projection optical system in a first axis direction;

a second stage that is movable within an area of a predetermined range including the first area and a third area located on the other side of the projection optical system in the first axis direction;

a stage drive system that drives the first stage and the second stage, and simultaneously drives the first stage and the second stage in the first axis direction while one of a state where the first stage and the second stage are close together in the first axis direction and a state where the first stage and the second stage are in contact in the first axis direction is maintained, during a transition from a first state in which one stage of the first stage and the second stage is positioned in the first area to a second state in which the other stage is positioned in the first area;

a first mark detection system arranged above the second area that detects a mark located on the first stage; and

a second mark detection system arranged above the third area that detects a mark located on the second stage.

7. The exposure apparatus of claim 6 wherein

the first stage and the second stage are both stages on which substrates can be mounted.

8. The exposure apparatus of claim 6 wherein

a part of an upper end portion in one stage of the first stage and the second stage on the side facing the other stage is a plate shaped hangover portion protruding over an other portion, and

a step portion that can engage with at least a tip of the overhang portion via a predetermined clearance is arranged in the other stage on at least a part of the surface facing the one stage, and in a state where the overhang portion and the step portion are engaged, a completely flat surface of a predetermined size can be formed by at least a part of the upper surface of the one stage and at least a part of the upper surface of the other stage.

9. The exposure apparatus of claim 6 wherein

the first stage and the second stage each have a plate shaped overhang portion protruding over an other portion in a part of an upper end portion on one side of the first axis direction, and a step portion that can engage with at least a tip of the overhang portion of the other stage via a predetermined clearance on at least a part of a surface on the other side of the first stage and the second stage in the first axis direction, and

in a state where the overhang portion of one stage and the step portion of the other stage are engaged, a completely flat surface of a predetermined size can be formed by at least a part of the upper surface of the one stage and at least a part of the upper surface of the other stage.

10. The exposure apparatus of claim 6 wherein

the stage drive system maintains the state where the first stage and the second stage are close together during the transition, and

in at least one of the first stage and the second stage, a suppressing member is arranged so as to suppress leakage of the liquid from a gap between the stages by being positioned in the gap between the stages during the transition.

11. The exposure apparatus of claim 10 wherein

the suppressing member includes at least one of a seal member and a water-repellent coating.

12. The exposure apparatus of claim 6 wherein

during the transition, the liquid continues to be held in the space between the projection optical system and the stage positioned at the first area.

13. The exposure apparatus of claim 6, the apparatus further comprising:

a first mirror and a second mirror arranged on the first stage and the second stage, respectively, on a surface besides the surface on the side where both stages are close together or are in contact during the transition; and

an interferometer that measures the position of the first stage and the second stage by irradiating measurement beams respectively on reflection surfaces of the first mirror and the second mirror, based on reflection beams from the reflection surfaces of the first mirror and the second mirror.

14. A device manufacturing method that includes a lithography step in which a substrate is exposed with the energy beam, using the exposure apparatus according to claim 6.

15. An exposure apparatus that supplies a liquid to a space between a projection optical system and a substrate and exposes the substrate via the projection optical system and the liquid, the apparatus comprising:

a first stage that is movable within an area of a predetermined range including a first area directly below the projection optical system where the liquid is supplied and a second area located on one side of the first area in a first axis direction;

a second stage that is movable independent from the first stage within an area of a predetermined range including the first area and the second area; and

a stage drive system that drives the first stage and the second stage, and simultaneously drives the first stage and the second stage in a second axis direction intersecting the first axis direction while one of a state where the first stage and the second stage are close together in the second axis direction and a state where the first stage and the second stage are in contact in the second axis direction is maintained, during a transition from a first state in which one stage of the first stage and the second stage is positioned in the first area to a second state in which the other stage is positioned in the first area.

16. The exposure apparatus according to claim 15 wherein

the stage drive system includes a set of linear actuators that drive the first stage and the second stage separately, which can engage freely detachably to both the first stage and the second stage and each of which can drive a specific stage in an engaged state in the second axis direction, the specific stage being one of the first stage and the second stage.

17. The exposure apparatus according to claim 16, the apparatus further comprising:

a switching unit that switches a state where one stage of the first stage and the second stage is in an engaged state with one linear actuator of the set of linear actuators and the other stage is in an engaged state with an other linear actuator to a state where the one stage engages with the other linear actuator and the other stage engages with the one linear actuator after the transition.

18. The exposure apparatus according to claim 15 wherein

the first stage and the second stage are both stages on which substrates can be mounted, and the apparatus further comprises:

a mark detection system disposed in the second area that detects a mark located on a specific stage, which is one of the first stage and the second stage positioned directly under the mark detection system.

19. The exposure apparatus of claim 15 wherein

the first stage and the second stage each have a plate shaped overhang portion protruding over an other portion in a part of the upper end portion on one side of a first axis direction, and on at least a part of a surface on the other side of the stages in the first axis direction, a step portion that can engage with at least a tip of the overhang portion of the other stage via a predetermined clearance is arranged, and

in a state where the overhang portion of one stage and the step portion of the other stage are engaged, a completely flat surface of a predetermined size can be formed by at least a part of the upper surface of the one stage and at least a part of the upper surface of the other stage.

20. The exposure apparatus of claim 15 wherein

the stage drive system maintains the state where the first stage and the second stage are close together during the transition, and

in at least one of the first stage and the second stage, a suppressing member is arranged so as to suppress leakage of the liquid from a gap between the stages by being positioned in the gap between the stages during the transition.

21. The exposure apparatus of claim 20 wherein

the suppressing member includes at least one of a seal member and a water-repellent coating.

22. The exposure apparatus of claim 15 wherein

during the transition, the liquid continues to be held in the space between the projection optical system and the stage positioned in the first area.

23. The exposure apparatus of claim 15, the apparatus further comprising:

a first mirror and a second mirror arranged on the first stage and the second stage, respectively, on a surface besides the surface on the side where both stages are close together or are in contact during the transition; and

an interferometer that irradiates measurement beams on reflection surfaces of the first mirror and the second mirror and measures the position of the first stage and the second stage, based on reflection beams from the reflection surfaces of the first mirror and the second mirror.

24. A device manufacturing method that includes a lithography step in which a substrate is exposed with the energy beam, using the exposure apparatus according to claim 15.

25. An exposure apparatus that supplies a liquid to a space between a projection optical system and a substrate and exposes the substrate via the projection optical system and the liquid, the apparatus comprising:

a first stage that is movable within an area including a first area directly below the projection optical system where the liquid is supplied and an area different from the first area;

a second stage that is movable independent from the first stage within the area including the first area and the area different from the first area;

a stage drive system that drives the first stage and the second stage, and simultaneously drives the first stage and the second stage in a predetermined direction while a state where the first stage and the second stage are close together in the predetermined direction is maintained, during a transition from a first state in which one stage of the first stage and the second stage is positioned in the first area to a second state in which the other stage is positioned in the first area; and

a suppressing member arranged in at least one of the first stage and the second stage, so as to suppress leakage of the liquid from a gap between the stages by being positioned in the gap between the stages during the transition.

26. The exposure apparatus of claim 25 wherein

the suppressing member includes at least one of a seal member and a water-repellent coating.

27. The exposure apparatus of claim 25 wherein

during the transition, the liquid continues to be held in the space between the projection optical system and the stage positioned in the first area.

28. The exposure apparatus of claim 25, the apparatus further comprising:

a first mirror and a second mirror arranged on the first stage and the second stage, respectively, on a surface besides the surface on the side where both stages are close together or are in contact during the transition; and

an interferometer that measures the position of the first stage and the second stage by irradiating measurement beams respectively on reflection surfaces of the first mirror and the second mirror, based on reflection beams from the reflection surfaces of the first mirror and the second mirror.

29. A device manufacturing method that includes a lithography step in which a substrate is exposed with the energy beam, using the exposure apparatus according to claim 25.