Position detection apparatus and exposure apparatus
First Claim
1. An exposure apparatus for exposing an object to light, said apparatus comprising:
- a camera which captures an image of a mark on the object to obtain image data corresponding to the image;
an extraction section which extracts an edge position in the image data obtained by differentiating the image data;
a determination section which determines a position of the mark by comparing the extracted edge position with a template; and
a control section which changes at least one of a parameter used by said extraction section and a parameter used by said determination section, based on a result of the comparing by said determination section,wherein the object to be exposed is positioned based upon the position of the mark determined by said determination section.
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Abstract
An exposure apparatus for exposing an object to light. The apparatus includes a camera which captures an image of a mark on the object to obtain image data corresponding to the image, an extraction section which extracts an edge position in the image data obtained by differentiating the image data, a determination section which determines a position of the mark by comparing the extracted edge position with a template, and a control section which changes at least one of a parameter used by the extraction section and a parameter used by the determination section, based on a result of the comparing by the determination section. The object to be exposed is positioned based upon the position of the mark determined by the determination section.
31 Citations
12 Claims
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1. An exposure apparatus for exposing an object to light, said apparatus comprising:
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a camera which captures an image of a mark on the object to obtain image data corresponding to the image; an extraction section which extracts an edge position in the image data obtained by differentiating the image data; a determination section which determines a position of the mark by comparing the extracted edge position with a template; and a control section which changes at least one of a parameter used by said extraction section and a parameter used by said determination section, based on a result of the comparing by said determination section, wherein the object to be exposed is positioned based upon the position of the mark determined by said determination section. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of manufacturing a semiconductor device, said method comprising steps of:
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capturing, using a camera, an image of a mark on a substrate to be exposed, to obtain image data corresponding to the image; extracting, using an extraction section, an edge position in the image data obtained by differentiating the image data; determining, using a determination section, a position of the mark by comparing the extracted edge position with a template; changing, using a control section, at least one of a parameter used in said extracting step and a parameter used in said determining step, based on a result of the comparing in said determining step; positioning the substrate based upon the position of the mark determined in said determining step; exposing the positioned substrate to light, to produce an exposed substrate; developing the exposed substrate, to produce a developed substrate; and processing the developed substrate to manufacture the semiconductor device.
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Specification