Method for smoothing and polishing surfaces by treating them with energetic radiation
First Claim
1. A method for smoothing and polishing a to-be-smoothed surface, comprising:
- a first treatment step comprising remelting the to-be-smoothed surface using energetic radiation while employing first treatment parameters at least once down to a first remelting depth which is greater than a structural depth of to-be-smoothed structures of said to-be-smoothed surface, wherein the using of energetic radiation includes using continuous energetic radiation or pulsed energetic radiation with a pulse duration of ≧
100 μ
s, such that said surface is remelted down to a first remelting depth of about 5 to 100 μ
m, anda second treatment step comprising leveling micro-roughness remaining on said surface after said first treatment step by remelting the micro-roughness using said energetic radiation while employing second treatment parameters down to a second remelting depth, and by evaporating roughness peaks, wherein the second remelting depth is less than said first remelting depth.
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Abstract
The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface is remelted in a first treatment step using said energetic radiation and employing first treatment parameters at least once down to a first remelting depth of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface, wherein continuous radiation or pulsed radiation with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polish any three-dimensional surface fast and cost effective.
71 Citations
15 Claims
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1. A method for smoothing and polishing a to-be-smoothed surface, comprising:
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a first treatment step comprising remelting the to-be-smoothed surface using energetic radiation while employing first treatment parameters at least once down to a first remelting depth which is greater than a structural depth of to-be-smoothed structures of said to-be-smoothed surface, wherein the using of energetic radiation includes using continuous energetic radiation or pulsed energetic radiation with a pulse duration of ≧
100 μ
s, such that said surface is remelted down to a first remelting depth of about 5 to 100 μ
m, anda second treatment step comprising leveling micro-roughness remaining on said surface after said first treatment step by remelting the micro-roughness using said energetic radiation while employing second treatment parameters down to a second remelting depth, and by evaporating roughness peaks, wherein the second remelting depth is less than said first remelting depth. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification