Manufacturing equipment using ION beam or electron beam

• US 7,592,606 B2
• Filed: 07/18/2007
• Issued: 09/22/2009
• Est. Priority Date: 07/19/2006
• Status: Active Grant

• Current Assignee: Hitachi High-Tech Company Limited (Hitachi, Ltd.)
• Original Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Inventors: Umemura, Kaoru, Kaneoka, Noriyuki, Ishiguro, Koji
• Primary Examiner(s): Vanore; David A
• Assistant Examiner(s): Logie; Michael J
• Application Number:
  US11/779,686
• Publication Number:
  US 20080018460A1
• Time in Patent Office: 797 Days
• Field of Search: 250/306, 250/307, 250/309, 250/310, 250/440.11, 250/492.21, 250/311, 250/442.11, 250/492.2, 250/492.1
• US Class Current: 250/442.11
• CPC Class Codes: H01J 2237/0225 Detecting or monitoring foreign particles
• CPC Class Codes: H01J 2237/05 Arrangements for energy or mass analysis
• CPC Class Codes: H01J 2237/24514 Beam diagnostics including control of the parameter or property diagnosed H01J2237/30472 takes precedence
• CPC Class Codes: H01J 2237/248 Components associated with the control of the tube
• CPC Class Codes: H01J 2237/30455 Correction during exposure
• CPC Class Codes: H01J 2237/31744 introducing gas in vicinity of workpiece
• CPC Class Codes: H01J 2237/31745 for preparing specimen to be viewed in microscopes or analyzed in microanalysers
• CPC Class Codes: H01J 37/3005 Observing the objects or the point of impact on the object
• CPC Class Codes: H01J 37/304 Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
• CPC Class Codes: H01J 37/3056 for microworking, e.g. etching of gratings, trimming of electrical components trimming of resistors H01C17/22

Abstract

Provided is a charged particle beam processing apparatus capable of improving yields by suppressing the spread of metal pollution to a semiconductor manufacturing process to a minimum. The charged particle beam processing apparatus includes an ion beam column 1 that is connected to a vacuum vessel 10 and irradiates a sample 35 with an ion beam 11 of nonmetal ion species, a microsampling unit 3 having a probe 16 that extracts a microsample 43 cut out from a sample 35 by the ion beam 11, a gas gun 2 that discharges a gas for bonding the microsample 43 and the probe 16, a pollution measuring beam column 6A that is connected to the same vacuum vessel 10 to which the ion beam column 1 is connected and irradiates an ion beam irradiation traces by the ion beam column 1 with a pollution measuring beam 13, and a detector 7 that detects characteristic X-rays emitted from the ion beam irradiation traces by the ion beam column 1 upon irradiation with the pollution measuring beam 13.

Claims

1. A charged particle beam processing apparatus, comprising:

a sample holder that holds a sample;

a stage that moves the sample holder;

a vacuum vessel that encloses the sample holder and the stage;

an ion generation source;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the sample with the ion beam;

a microsampling unit having a probe that picks out a micro test piece cut out of the sample by an ion beam from the ion beam column;

a gas gun that discharges a gas that bonds the micro test piece and the probe together;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is connected and irradiates ion beam irradiation traces formed by the ion beam column with a pollution measuring beam, which is an electron beam or an X-ray beam; and

a detector that detects a characteristic X-ray that is emitted from the ion beam irradiation traces formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column,

wherein an aiming position of an ion beam from the ion beam column and an aiming position of a pollution measuring beam from the pollution measuring beam column are spaced from each other and, in a state where the ion beam irradiation traces formed by the ion beam column are irradiated with a pollution measuring beam, the position of the sample holder is adjustable by driving the stage, whereby the ion beam irradiation traces are caused to coincide with the aiming position of a pollution measuring beam.

2. The charged particle beam processing apparatus according to claim 1, wherein the nonmetallic ion species is an inactive gas species, oxygen or nitrogen.

3. The charged particle beam processing apparatus according to claim 1, wherein a pollution monitoring jig having a pollution measuring sample for irradiating a portion of the sample holder other than a region holding a sample with an ion beam is detachably provided and after the pollution measuring sample is irradiated with an ion beam before sample processing, an element of the ion beam irradiation traces is measured by irradiating the pollution measuring sample with a pollution measuring beam, whereby whether a metal is contained in the ion beam is detected beforehand.

4. The charged particle beam processing apparatus according to claim 1, wherein the charged particle beam processing apparatus incorporates a program for causing a control unit to execute processing that involves measuring the content of a metal on the basis of the characteristic X-ray detected by the detector and passing judgment on the occurrence or nonoccurrence of pollution by comparing the measured metal content with a preset pollution judgment value.

5. The charged particle beam processing apparatus according to claim 4, wherein the charged particle beam processing apparatus further comprises a console that is provided with a pollution monitoring button that gives instructions to start the execution of the program and warning means that informs an operator of the occurrence of pollution when the pollution has been recognized as a result of the pollution measurement.

6. The charged particle beam processing apparatus according to claim 5, wherein the console has display means for pollution control measures that display details of pollution control measures on the basis of a metallic ion species whose value exceeds the pollution judgment value when the pollution has been recognized.

7. The charged particle beam processing apparatus according to claim 1, wherein the pollution measuring beam column also serves as an observational electron beam column.

8. The charged particle beam processing apparatus according to claim 1, wherein a housing of the ion beam column is formed to be bent so that the output axis of an ion beam from the ion generation source is inclined with respect to the axis of incidence of an ion beam incident on a sample.

9. The charged particle beam processing apparatus according to claim 1, wherein the charged particle beam processing apparatus further comprises an observational electron beam column constituted by any one of an STEM, a TEM and an SEM.

10. The charged particle beam processing apparatus according to claim 1, wherein the sample holder is provided with a mesh on which a microsample picked out of a sample by the microsampling unit is mounted and the microsample mounted on the mesh is thin-film processed within the vacuum vessel by an ion beam from the ion beam column.

11. A charged particle beam processing apparatus, comprising:

a pollution monitoring jig having a pollution measuring sample to which an ion beam is to be irradiated;

a vacuum vessel that encloses the pollution monitoring jig;

an ion generation source;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the pollution measuring sample with the ion beam;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is connected and irradiates ion beam irradiation traces in the pollution measuring sample formed by the ion beam column with a pollution measuring beam, which is an electron beam or an X-ray beam; and

a detector that detects a characteristic X-ray emitted from the ion beam irradiation traces in the pollution measuring sample formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column,

wherein an aiming position of an ion beam from the ion beam column and an aiming position of a pollution measuring beam from the pollution measuring beam column are spaced from each other and, in a state where the ion beam irradiation traces in the pollution measuring sample are irradiated with a pollution measuring beam, the position of the pollution measuring sample is adjustable by driving the stage, whereby the ion beam irradiation traces are caused to coincide with the aiming position of a pollution measuring beam.

12. The charged particle beam processing apparatus according to claim 11, wherein the nonmetallic ion species is an inactive gas species, oxygen or nitrogen.

13. The charged particle beam processing apparatus according to claim 11, wherein the charged particle beam processing apparatus incorporates a program for causing a control unit to execute processing that involves measuring the content of a metal on the basis of the characteristic X-ray detected by the detector and passing judgment on the occurrence or nonoccurrence of pollution by comparing the measured metal content with a preset pollution judgment value.

14. The charged particle beam processing apparatus according to claim 13, wherein the charged particle beam processing apparatus further comprises a console that is provided with a pollution monitoring button that gives instructions to start the execution of the program and warning means that informs an operator of the occurrence of pollution when the pollution has been recognized as a result of the pollution measurement.

15. The charged particle beam processing apparatus according to claim 14, wherein the console has display means for pollution control measures that display details of pollution control measures on the basis of a metallic ion species whose value exceeds the pollution judgment value when the pollution has been recognized.

16. A charged particle beam processing apparatus, comprising:

a sample holder that holds a sample;

a stage that moves the sample holder;

a vacuum vessel that encloses the sample holder and the stage;

an ion generation source;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the sample with the ion beam;

a microsampling unit having a probe that picks out a micro test piece cut out of the sample by an ion beam from the ion beam column;

a gas gun that discharges a gas that bonds the micro test piece and the probe together;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is connected and irradiates ion beam irradiation traces formed by the ion beam column with a pollution measuring beam, which is an electron beam or an X-ray beam;

a detector that detects a characteristic X-ray that is emitted from the ion beam irradiation traces formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column; and

a pollution monitoring jig having a pollution measuring sample to which an ion beam is to be irradiated, the pollution measuring sample being provided in a portion of the sample holder other than a region holding a sample,

wherein after the pollution measuring sample is irradiated with an ion beam before sample processing, an element of the ion beam irradiation traces in the pollution measuring sample is measured by irradiating the pollution measuring sample with a pollution measuring beam, whereby whether a metal is contained in the ion beam is detected beforehand, and

wherein an aiming position of an ion beam from the ion beam column and an aiming position of a pollution measuring beam from the pollution measuring beam column are spaced from each other and, in a state where the ion beam irradiation traces in the pollution measuring sample are irradiated with a pollution measuring beam, the position of the pollution measuring sample is adjustable by driving the stage, whereby the ion beam irradiation traces are caused to coincide with the aiming position of a pollution measuring beam.

17. The charged particle beam processing apparatus according to claim 16, wherein the nonmetallic ion species is an inactive gas species, oxygen or nitrogen.

18. The charged particle beam processing apparatus according to claim 16, wherein the charged particle beam processing apparatus incorporates a program for causing a control unit to execute processing that involves measuring the content of a metal on the basis of the characteristic X-ray detected by the detector and passing judgment on the occurrence or nonoccurrence of pollution by comparing the measured metal content with a preset pollution judgment value.

19. The charged particle beam processing apparatus according to claim 16, wherein the charged particle beam processing apparatus further comprises a console that is provided with a pollution monitoring button that gives instructions to start the execution of the program, warning means that informs an operator of the occurrence of pollution when the pollution has been recognized as a result of the pollution measurement and display means for pollution control measures that display details of pollution control measures on the basis of a metallic ion species whose value exceeds the pollution judgment value when the pollution has been recognized.

20. A charged particle beam processing apparatus, comprising:

a sample holder that holds a sample;

a stage that moves the sample holder;

a vacuum vessel that encloses the sample holder and the stage;

an ion generation source;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the sample with the ion beam;

a microsampling unit having a probe that picks out a micro test piece cut out of the sample by an ion beam from the ion beam column;

a gas gun that discharges a gas that bonds the micro test piece and the probe together;

an observational electron beam column constituted by any one of an STEM a TEM and an SEM;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is connected and irradiates ion beam irradiation traces formed by the ion beam column with a pollution measuring beam which is an electron beam or an X-ray beam; and

a detector that detects a characteristic X-ray that is emitted from the ion beam irradiation traces formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column.

21. A charged particle beam processing apparatus, comprising:

a pollution monitoring jig having a pollution measuring sample to which an ion beam is to be irradiated;

a vacuum vessel that encloses the pollution monitoring jig;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the pollution measuring sample with the ion beam;

an observational electron beam column constituted by any one of an STEM, a TEM and an SEM;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is connected and irradiates ion beam irradiation traces in the pollution measuring sample formed by the ion beam column with a pollution measuring beam, which is an electron beam or an X-ray beam; and

a detector that detects a characteristic X-ray emitted from the ion beam irradiation traces in the pollution measuring sample formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column.

22. A charged particle beam processing apparatus, comprising:

a sample holder that holds a sample;

a stage that moves the sample holder;

a vacuum vessel that encloses the sample holder and the stage;

an ion generation source;

an ion beam column that is connected to the vacuum vessel, takes out an ion beam of a nonmetallic ion species from the ion generation source and irradiates the sample with the ion beam;

a microsampling unit having a probe that picks out a micro test piece cut out a sample by an ion beam from the ion beam column a gas gun that discharges a gas that bonds the micro test piece and the probe together;

a pollution measuring beam column that is connected to the same vacuum vessel to which the ion beam column is, connected and irradiates ion beam irradiation traces formed by the ion beam column with a pollution measuring beam, which is, an electron beam or an X-ray beam;

an observational electron beam column constituted by any one of an STEM, a TEM and an SEM;

a detector that detects a characteristic X-ray that is emitted from the ion beam irradiation traces formed by the ion beam column upon irradiation with a pollution measuring beam from the pollution measuring beam column; and

a pollution monitoring jig having a pollution measuring sample to which an ion beam is to be irradiated, the pollution measuring sample being provided in a portion of the sample holder other than a region holding a sample;

wherein after the pollution measuring sample is irradiated with an ion beam before sample processing, an element of the ion beam irradiation traces in the pollution measuring sample is measured by irradiating the pollution measuring sample with a pollution measuring beam, whereby whether a metal is contained in the ion beam is detected beforehand.