Lithographic apparatus and device manufacturing method

• US 7,592,760 B2
• Filed: 09/11/2006
• Issued: 09/22/2009
• Est. Priority Date: 09/11/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Butler, Hans, Klaassen, Franciscus Adrianus Gerardus
• Primary Examiner(s): Leykin; Rita
• Application Number:
  US11/518,487
• Publication Number:
  US 20080062394A1
• Time in Patent Office: 1,107 Days
• Field of Search: 318/649, 318/135, 318/687, 355/53, 355/18, 250/200, 250/203, 250/7, 310/12, 310/14
• US Class Current: 318/135
• CPC Class Codes: G03B 27/58 Baseboards, masking frames, or other holders for the sensitive material G03B27/53 takes precedence ; for electrophotographic copiers G03G15/65
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Abstract

A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.

Claims

1. A positioning device configured to position a first movable object and a second movable object in a substantially common operation area, the positioning device comprising:

a first coil assembly arranged at one side of the operation area;

a second coil assembly arranged at an opposite side of the operation area;

a first magnet arranged on the first movable object and configured to cooperate with the first coil assembly; and

a second magnet arranged on the second movable object and configured to cooperate with the second coil assembly,

wherein the first and second coil assemblies extend substantially over the whole common operation area.

2. The positioning device of claim 1, wherein the first magnet of the first movable object is arranged at a side of the first movable object where the first coil array is arranged, and wherein the second magnet of the second movable object is arranged at a side of the second movable object where the second coil array is arranged.

3. The positioning device of claim 1, wherein the positioning device comprises a first shielding device arranged on the first movable object and configured to substantially shield the first magnet of the first movable object from influence of the second coil assembly.

4. The positioning device of claim 1, wherein the positioning device comprises a second shielding device arranged on the second movable object and configured to substantially shield the second magnet of the second movable object from influence of the first coil assembly.

5. The positioning device of claim 1, wherein the positioning device is configured to actuate each of the first and the second movable objects in at least two degrees of freedom.

6. The positioning device of claim 1, wherein the positioning device is configured to actuate each of the first and second movable objects in a horizontal plane.

7. The positioning device of claim 1, wherein the first coil assembly comprises a plurality of coils arranged in a first coil plate, and the second coil assembly comprises a plurality of coils arranged in a second coil plate.

8. A lithographic apparatus comprising:

a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross- section to form a patterned radiation beam;

a first substrate stage and a second substrate stage each constructed to hold a substrate and being movable in a common operation area;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

a positioning device configured to position the first substrate stage and the second substrate stage in the common operation area, the positioning device comprising

a first coil assembly arranged at one side of the operation area,

a second coil assembly arranged at an opposite side of the operation area,

a first magnet arranged on the first substrate stage and configured to cooperate with the first coil assembly, and

a second magnet arranged on the second substrate stage and configured to cooperate with the second coil assembly,

wherein the first and second coil assemblies extend substantially over the whole common operation area.

9. The lithographic apparatus of claim 8, wherein the first coil assembly is arranged at a side of the operation area where the projection system is located.

10. The lithographic apparatus of claim 9, wherein the first coil assembly is arranged in a first coil plate, and wherein the first coil plate comprises an opening for the projection system.

11. A positioning device configured to position a first movable object and a second movable object in a substantially common operation area, the positioning device comprising:

a first magnet arranged on the first movable object;

a second magnet arranged on the second movable object; and

three or more coil plates each comprising a coil assembly, the three or more coil plates being arranged adjacent to each other, and extending substantially in a same plane at one side of the substantially common operation area,

wherein each of the three or more coil plates is configured to cooperate with the first magnet or the second magnet to actuate the first or second movable object, respectively.

12. The positioning device of claim 11, wherein, during actuation of the first or second movable object with one of the three or more coil plates, the first magnet or the second magnet is located above the one of the three or more coil plates.

13. The positioning device of claim 11, wherein, during operation, the first movable object is actuated by at least a first coil plate of the three or more coil. plates and the second movable object is actuated by at least a second coil plate of the three or more coil plates.

14. The positioning device of claim 11, wherein, when the first movable object is moved from a first coil plate of the three or more coil plates to a second coil plate of the three or more coil plates, the second movable object is actuated by at least a third coil plate of the three or more coil plates.

15. The positioning device of claim 11, wherein the positioning device comprises four or more adjacent coil plates extending substantially in a same plane.

16. The positioning device of claim 11, wherein the three or more coil plates cover the whole operation area of the first movable object and the second movable object.

17. A lithographic apparatus comprising:

a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross- section to form a patterned radiation beam;

a first substrate stage and a second substrate stage each constructed to hold a substrate and being movable in a common operation area;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and

a positioning device configured to position the first substrate stage and the second substrate stage in a substantially common operation area, the positioning device comprising

a first magnet arranged on the first substrate stage,

a second magnet arranged on the second substrate stage, and

three or more coil plates each comprising a coil assembly, the three or more coil plates being arranged adjacent to each other, and extending substantially in a same plane at one side of the substantially common operation area, each of the three or more coil plates configured to cooperate with the first magnet or the second magnet to actuate the first or second substrate stage, respectively.

18. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a substrate; and

positioning a first substrate stage and a second substrate stage in a common operation area with a positioning device, each of the first and second substrate stages configured to support the substrate, the positioning device comprising

a first coil assembly arranged at one side of the operation area,

a second coil assembly arranged at an opposite side of the operation area,

a first magnet arranged on the first substrate stage and configured to cooperate with the first coil assembly, and

a second magnet arranged on the second substrate stage and configured to cooperate with the second coil assembly.

19. A positioning device configured to position a first substrate table and a second substrate table of a lithographic apparatus in a substantially common operation area, the positioning device comprising:

a first and a second coil assembly extending substantially over the common operation area, the first and the second substrate tables arranged between the first and the second coil assemblies;

a first magnet assembly arranged on the first substrate table and configured to cooperate with the first coil assembly to move the first substrate table in the common operation area; and

a second magnet assembly arranged on the second substrate table and configured to cooperate with the second coil assembly to move the second substrate table in the common operation area.