Lithographic apparatus and device manufacturing method

• US 7,593,092 B2
• Filed: 06/08/2006
• Issued: 09/22/2009
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sengers, Timotheus Franciscus, Donders, Sjoerd Nicolaas Lambertus, Bijlaart, Erik Theodorus Maria, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Butler, Hans, Streefkerk, Bob, Van Schaik, Frank, De Smit, Joannes Theodoor, Loopstra, Erik Roelof, Straaijer, Alexander, Mertens, Jeroen Johannes Sophia Maria, Lof, Joeri, Ritsema, Roelof Aeilko Siebrand, Van Santen, Helmar, Simon, Klaus, Hoogendam, Christiaan Alexander, Kolesnychenko, Aleksey
• Primary Examiner(s): Kim; Peter B
• Application Number:
  US11/448,990
• Publication Number:
  US 20070132970A1
• Time in Patent Office: 1,202 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 359/380, 250/548, 250/492.2
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1. A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed, in use, in liquid, said apparatus comprising:

a table to attract the substrate; and

a preventing system to prevent the liquid from reaching the undersurface of the substrate, wherein the preventing system is configured to not extend above the top surface of the substrate.

2. An apparatus according to claim 1, wherein said preventing system comprises a flexible sealing member arranged so that said flexible sealing member is in contact with the undersurface along a periphery of the undersurface.

3. An apparatus according to claim 1, wherein said preventing system comprises a differential fluid removal system to differentially-remove fluid from a space between the undersurface and said table along a periphery of the undersurface.

4. An apparatus according to claim 1, wherein said preventing system comprises a liquid seal reservoir arranged along a periphery of the table.

5. An apparatus according to claim 4, wherein said preventing system comprises a groove defined by said table, and a supply unit to supply a liquid seal to said groove.

6. An apparatus according to claim 5, wherein said preventing system comprises a port to remove the liquid seal in said groove.

7. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of an original onto a substrate;

a liquid application device for applying liquid to the substrate;

a table for securing the substrate; and

a liquid prevention device for preventing liquid from contacting an undersurface of the substrate, wherein the liquid prevention device is configured to be below the top surface of the substrate.

8. A method of manufacturing a device, comprising the steps of:

providing a projecting optical system for projecting a pattern of an original onto a substrate;

securing the substrate with a table;

applying a liquid to the substrate; and

preventing liquid from contacting an undersurface of the substrate using a liquid prevention device that does not extend above the top surface of the substrate.

9. A substrate holding apparatus for securing an underside of a substrate, with at least a portion of a top surface of the substrate being immersed, in use, in liquid, said apparatus comprising:

a table to secure the substrate from the underside; and

a liquid sealing device for sealing the underside of the substrate from exposure to the liquid, wherein the liquid sealing device is configured to be below the top surface of the substrate.

10. A substrate holding apparatus according to claim 9, wherein said liquid sealing device includes a flexible sealing member arranged to be in contact along a periphery of the undersurface.

11. A substrate holding apparatus according to claim 9, wherein said liquid sealing device includes a port to remove fluid from a space along a periphery of the undersurface.

12. A substrate holding apparatus according to claim 11, wherein said port includes a plurality of ducts, with each said duct having a different removal pressure.

13. A substrate holding apparatus according to claim 9, wherein said liquid sealing device includes a liquid seal reservoir arranged around a periphery of said table.

14. A substrate holding apparatus according to claim 13, wherein said liquid seal reservoir includes a liquid supply duct and a liquid removal duct.

15. A substrate holding apparatus according to claim 9, wherein said table is a vacuum table.