Lithographic apparatus and device manufacturing method

• US 7,593,093 B2
• Filed: 02/26/2007
• Issued: 09/22/2009
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Schaik, Frank, Ritsema, Roelof Aeilko Siebrand, Kolesnychenko, Aleksey, Sengers, Timotheus Franciscus, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, De Smit, Joannes Theodoor, Loopstra, Erik Roelof, Straaijer, Alexander, Mertens, Jeroen Johannes Sophia Maria, Lof, Joeri, Van Santen, Helmar, Simon, Klaus
• Primary Examiner(s): Kim; Peter B
• Application Number:
  US11/710,408
• Publication Number:
  US 20070268471A1
• Time in Patent Office: 939 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 250/548, 250/492.2, 359/380
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a projection system configured to project the patterned beam onto a target portion of a substrate;

a substrate table configured to hold the substrate, said substrate table comprising;

an edge seal member configured to at least partly surround an edge of at least one of said substrate and an object positioned on said substrate table, and

a further edge seal member configured to extend across the gap between said edge seal member and said at least one of said substrate and said object and to be in contact with said at least one of said substrate and said object; and

a liquid supply system configured to provide a liquid, through which said beam is to be projected, in a space between said projection system and said at least one of said substrate and said object, wherein said further edge seal member is flexible.

2. An apparatus according to claim 1, wherein said flexible further edge seal member is attached to said edge seal member.

3. An apparatus according to claim 1, wherein said flexible further edge seal member has a port, connected to a vacuum source, adjacent its end distal from said edge seal member, such that on actuation of said vacuum source, said flexible further edge seal member is deflectable upwards to contact against said at least one of said substrate and said object to form a seal between said flexible further edge seal member and said at least one of said substrate and said object due to the force generated by the vacuum source acting on said at least one of said substrate and said object.

4. An apparatus according to claim 1, further comprising a second flexible further edge seal member attached under said at least one of said substrate and said object to said substrate table and with a free end radially outwardly from the attachment point.

5. An apparatus according to claim 1, wherein said flexible further edge seal member is disposed between said edge seal member and said at least one of said substrate and said object and with a surface substantially co-planar with said primary surfaces of said edge seal member and said at least one of said substrate and said object.

6. An apparatus according to claim 5, wherein said flexible further edge seal member is shaped to contact said at least one of said substrate and said object on a surface opposite its primary surface.

7. An apparatus according to claim 5, wherein said flexible further edge seal member is effective to apply a force to said at least one of said substrate and said object away from said substrate table when said at least one of said substrate and said object is held on said substrate table.

8. An apparatus according to claim 1, wherein said object comprises a sensor.

9. An apparatus according to claim 1, wherein at least one said edge seal member and further edge seal member is glued to said at least one of said substrate and said object around a periphery of said at least one of said substrate and said object.