Patterning device
First Claim
1. A lithography apparatus, comprising:
- an illumination system configured to condition a beam of radiation;
a patterning device configured to pattern the beam of radiation, the patterning device comprising,a control system configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values, andan array of individually controllable elements, corresponding ones of the individually controllable elements in the array of individually controllable elements being configured to actuate based on receiving a corresponding one of the differential control signals; and
a projection system configured to project the patterned beam onto a target area of a substrate.
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Accused Products
Abstract
A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.
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Citations
39 Claims
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1. A lithography apparatus, comprising:
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an illumination system configured to condition a beam of radiation; a patterning device configured to pattern the beam of radiation, the patterning device comprising, a control system configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values, and an array of individually controllable elements, corresponding ones of the individually controllable elements in the array of individually controllable elements being configured to actuate based on receiving a corresponding one of the differential control signals; and a projection system configured to project the patterned beam onto a target area of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A device manufacturing method, comprising:
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generating differential control signals having respective first voltages from analog input signals having second, lower voltages; controlling respective ones of individually controllable elements within an array of individually controllable elements using corresponding ones of the differential control signals; patterning a beam of radiation using the array of individually controllable elements; and projecting the patterned beam onto a target portion of a substrate.
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21. A patterning device, comprising:
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a control system configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values, and an array of individually controllable elements, corresponding ones of the individually controllable elements in the array of individually controllable elements being configured to actuate based on receiving a corresponding one of the differential control signals. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
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Specification