Method of optical proximity correction design for contact hole mask
First Claim
1. A method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate, comprising the steps of:
- defining a transmission cross coefficient (“
TCC”
) function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator;
representing at least one resolvable feature comprising a contiguous area of a mask by at least one impulse function at a single point of the contiguous area; and
creating an interference map by processing the at least one impulse function with the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive optical interference near the resolvable feature on the substrate as a result of the mask being illuminated by the illuminator.
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Accused Products
Abstract
Disclosed concepts include a method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate. Illumination is optimized by defining a transmission cross coefficient (“TCC”) function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator, representing at least one resolvable feature of a mask to be printed on the substrate by at least one impulse function, and creating an interference map of a predetermined order based on the at least one impulse function and the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive interference.
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Citations
13 Claims
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1. A method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate, comprising the steps of:
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defining a transmission cross coefficient (“
TCC”
) function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator;representing at least one resolvable feature comprising a contiguous area of a mask by at least one impulse function at a single point of the contiguous area; and creating an interference map by processing the at least one impulse function with the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive optical interference near the resolvable feature on the substrate as a result of the mask being illuminated by the illuminator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A program product, comprising executable code transportable by at least one machine readable medium, wherein execution of the code by at least one programmable computer causes the at least one programmable computer to perform a sequence of steps for optimizing an illumination profile of a pattern to be formed in a surface of a substrate, comprising:
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defining a transmission cross coefficient (“
TCC”
) function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator;representing at least one resolvable feature comprising a contiguous area of a mask by at least one impulse function at a single point of the contiguous area; and generating an interference map by processing the at least one impulse function with the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive optical interference near the resolvable feature on the substrate as a result of the mask being illuminated by the illuminator. - View Dependent Claims (11, 12, 13)
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Specification