Wafer probe station having environment control enclosure

• US 7,595,632 B2
• Filed: 01/02/2008
• Issued: 09/29/2009
• Est. Priority Date: 06/11/1992
• Status: Expired due to Fees

• Current Assignee: Cascade Microtech Incorporated (FormFactor Incorporated)
• Original Assignee: Cascade Microtech Incorporated (FormFactor Incorporated)
• Inventors: Koxxy, Martin J., Harwood, Warren K., Tervo, Paul A.
• Primary Examiner(s): Karlsen; Ernest F
• Application Number:
  US12/006,438
• Publication Number:
  US 20080106290A1
• Time in Patent Office: 636 Days
• Field of Search: 324754-765, 324/158.1
• US Class Current: 324/757.03
• CPC Class Codes: A46D 1/00 Bristles; Selection of materials for bristles making artificial bristles D01D, D01F
• CPC Class Codes: G01R 1/06705 Apparatus for holding or moving single probes for moving multiple probe heads or ICs under test G01R31/2886
• CPC Class Codes: G01R 1/18 Screening arrangements against electric or magnetic fields, e.g. against earth's field
• CPC Class Codes: G01R 31/2862 Chambers or ovens; Tanks
• CPC Class Codes: G01R 31/2868 Complete testing stations; systems; procedures; software aspects
• CPC Class Codes: G01R 31/2886 Features relating to contacting the IC under test, e.g. probe heads; chucks G01R31/2865 takes precedence, test connections, e.g. test sockets, or probes per se, G01R1/04 or G01R1/06
• CPC Class Codes: G01R 31/2887 involving moving the probe head or the IC under test; docking stations moving single probes G01R1/06705; moving individual probes in multiple probes G01R1/07392
• CPC Class Codes: H01L 21/68714 the wafers being placed on a susceptor, stage or support
• CPC Class Codes: H01L 21/68785 characterised by the mechanical construction of the susceptor, stage or support

Abstract

A wafer probe station is equipped with an integrated environment control enclosure substantially surrounding a supporting surface for holding a test device, such enclosure limiting fluid communication between the interior and exterior of the enclosure and preferably also providing EMI shielding and a dark environment. The limited communication between the interior and exterior of the enclosure is kept substantially constant despite positioning movement of either the supporting surface or probes. The positioning mechanisms for the supporting surface and probes each are located at least partially outside of the enclosure.

Claims

1. A probe station comprising:

(a) a chuck including a chuck surface for supporting a test device;

(b) at least one support for a probe to contact said test device;

(c) an enclosure defining an upper aperture for receiving said support; and

(d) a conductive lower member conductively isolated from said chuck surface and slidably supported within said enclosure;

said lower member defining a lower aperture for said enclosure capable of relative lateral movement with respect to said upper aperture.

2. The probe station of claim 1 wherein said lower member comprises a plurality of overlapping relatively slidable plates of different sizes and defining apertures of different sizes.

3. The probe station of claim 1 further comprising a positioner extending through said lower aperture, movement of said positioner moving said lower aperture laterally relative to said upper aperture.

4. The probe station of claim 3, wherein said enclosure has an upper member extending substantially laterally over said chuck.

5. The probe station of claim 3 wherein said positioner includes a motor assembly beneath said lower member for moving said positioner.

6. The probe station of claim 1 wherein said enclosure includes a door for selectively accessing said chuck.

7. The probe station of claim 1, said enclosure substantially shielding said chuck against electromagnetic interference.

8. The probe station of claim 1, said enclosure substantially shielding said chuck against light.

9. The probe station of claim 1, said enclosure limiting fluid communication between the interior and exterior of said enclosure.