Method of producing multi-wavelength semiconductor laser device
First Claim
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1. A method for producing a multi-wavelength semiconductor laser device, comprising the steps of:
- preparing a substrate for growth of a nitride single crystal thereon;
sequentially growing a first conductivity-type first clad layer, a first active layer and a second conductivity-type first clad layer on the substrate, to form a nitride epitaxial layer;
separating the nitride epitaxial layer from the substrate;
attaching the separated nitride epitaxial layer to a first conductivity-type substrate;
selectively removing the nitride epitaxial layer such that a portion of the substrate is exposed, to form a first semiconductor laser structure;
sequentially growing a first conductivity-type second clad layer, a second active layer and a second conductivity-type second clad layer on the exposed portion of the first conductivity-type substrate, to form a second semiconductor laser structure separated from the first semiconductor laser structure;
sequentially growing a first conductivity-type third clad layer, a third active layer and a second conductivity-type third clad layer on the remaining portion of the first conductivity-type substrate, to form a third semiconductor laser structure separated from the first and second semiconductor laser structures; and
forming a first electrode connected to a bottom surface of the first conductivity-type substrate and forming second electrodes connected to the respective second conductivity-type clad layers of the first, second and third semiconductor laser structures.
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Abstract
A method for producing a multi-wavelength semiconductor laser device includes the steps of: forming a nitride epitaxial layer on a substrate for growth of a nitride single crystal; separating the nitride epitaxial layer from the substrate; attaching the separated nitride epitaxial layer to a first conductivity-type substrate; selectively removing the nitride semiconductor epitaxial layer to expose a portion of the first conductivity-type substrate and to form a first semiconductor laser structure; and sequentially forming second and third semiconductor laser structures on the exposed portion of the first conductivity-type substrate.
26 Citations
12 Claims
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1. A method for producing a multi-wavelength semiconductor laser device, comprising the steps of:
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preparing a substrate for growth of a nitride single crystal thereon; sequentially growing a first conductivity-type first clad layer, a first active layer and a second conductivity-type first clad layer on the substrate, to form a nitride epitaxial layer; separating the nitride epitaxial layer from the substrate; attaching the separated nitride epitaxial layer to a first conductivity-type substrate; selectively removing the nitride epitaxial layer such that a portion of the substrate is exposed, to form a first semiconductor laser structure; sequentially growing a first conductivity-type second clad layer, a second active layer and a second conductivity-type second clad layer on the exposed portion of the first conductivity-type substrate, to form a second semiconductor laser structure separated from the first semiconductor laser structure; sequentially growing a first conductivity-type third clad layer, a third active layer and a second conductivity-type third clad layer on the remaining portion of the first conductivity-type substrate, to form a third semiconductor laser structure separated from the first and second semiconductor laser structures; and forming a first electrode connected to a bottom surface of the first conductivity-type substrate and forming second electrodes connected to the respective second conductivity-type clad layers of the first, second and third semiconductor laser structures. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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