×

Vitreous carbon mask substrate for X-ray lithography

  • US 7,608,367 B1
  • Filed: 07/28/2005
  • Issued: 10/27/2009
  • Est. Priority Date: 04/22/2005
  • Status: Expired due to Fees
First Claim
Patent Images

1. A lithographic mask comprising a vitreous carbon substrate, wherein a surface of the vitreous carbon substrate comprises a microscopically roughened surface and a patterned metal X-ray absorber layer adhering to the microscopically roughened surface.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×