×

Generation of pattern data with no overlapping or excessive distance between adjacent patterns

  • US 7,612,847 B2
  • Filed: 09/05/2002
  • Issued: 11/03/2009
  • Est. Priority Date: 09/07/2001
  • Status: Active Grant
First Claim
Patent Images

1. A device for generating pattern data for unevenness that is randomly arranged on a reflecting surface, said device comprising:

  • coordinate displacement means for generating a multiplicity of displaced coordinates that are randomly displaced in two dimensions with a limitation on the arrangement of patterns to prevent overlap or excessive distance between patterns; and

    pattern generation means for arranging predetermined line patterns according to at least a portion of or all of said displaced coordinates generated by said coordinate displacement means to generate the pattern data for unevenness that is randomly arranged on the reflecting surface, wherein said coordinate displacement means includes means for displacing said base coordinates such that half width H of a distribution graph of the displacements of said displaced coordinates satisfies the relationship with a basic pitch P;

    0.3 P≦

    H≦

    0.9 P.

View all claims
  • 3 Assignments
Timeline View
Assignment View
    ×
    ×