Defectivity and process control of electroless deposition in microelectronics applications
First Claim
1. An electroless deposition composition for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices, the deposition composition comprising (a) a source of deposition ions selected from the group consisting of Co ions and Ni ions, (b) a reducing agent selected from the group consisting of a phosphorus-based reducing agent, a borane-based reducing agent, and a combination thereof, and (c) an oxygen scavenger selected from the group consisting of SO32−
- , HSO3−
, or a combination thereof.
6 Assignments
0 Petitions
Accused Products
Abstract
Methods and compositions for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices. Grain refiners, levelers, oxygen scavengers, and stabilizers for electroless Co and Ni deposition solutions.
77 Citations
11 Claims
-
1. An electroless deposition composition for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices, the deposition composition comprising (a) a source of deposition ions selected from the group consisting of Co ions and Ni ions, (b) a reducing agent selected from the group consisting of a phosphorus-based reducing agent, a borane-based reducing agent, and a combination thereof, and (c) an oxygen scavenger selected from the group consisting of SO32−
- , HSO3−
, or a combination thereof. - View Dependent Claims (2, 3, 4, 5, 6)
- , HSO3−
-
7. A method for electrolessly depositing Co, Ni, or alloys thereof onto a substrate in manufacture of microelectronic devices, the method comprising:
contacting the substrate with an electroless deposition composition comprising (a) a source of deposition ions selected from the group consisting of Co ions and Ni ions, (b) a reducing agent selected from the group consisting of a phosphorus-based reducing agent, a borane-based reducing agent, and a combination thereof, and (c) an oxygen scavenger selected from the group consisting of SO32−
, HSO3−
, or a combination thereof.- View Dependent Claims (8, 9, 10, 11)
Specification