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System and method for providing defect printability analysis of photolithographic masks with job-based automation

  • US 7,617,474 B2
  • Filed: 06/26/2006
  • Issued: 11/10/2009
  • Est. Priority Date: 09/17/1997
  • Status: Expired due to Fees
First Claim
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1. A graphic user interface (GUI) for defect printability analysis on a photolithographic mask using simulation, the GUI comprising:

  • a main menu bar including;

    a plurality of setting links;

    a job run link; and

    a plurality of review links,wherein the plurality of setting links allow a user to input parameters used to perform the simulation on the photolithographic mask, the job run link allows a user to designate a job type as one of the simulation and an automatic defect severity score, and the plurality of review links allow the user to view results of the simulation at different levels of detail.

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