Method of making a diode read/write memory cell in a programmed state
First Claim
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1. A method of making a diode, comprising:
- forming a first electrode;
forming a semiconductor region in electrical contact with the first electrode, wherein the semiconductor region comprises a p-n or a p-i-n junction in at least one silicon, germanium or silicon-germanium layer;
forming a titanium layer on the semiconductor region;
forming a titanium nitride layer on the titanium layer;
reacting the titanium layer with the semiconductor region to form a titanium silicide, titanium germanide, or titanium silicide-germanide layer on the semiconductor region;
removing the titanium nitride layer and a remaining portion of the titanium layer after the step of reacting; and
forming a second electrode in electrical contact with the titanium silicide, titanium germanide or titanium silicide-germanide layer;
wherein the titanium silicide, titanium germanide or titanium silicide-germanide layer comprises a C49 phase titanium silicide, a C49 phase titanium germanide or a C49 phase titanium silicide-germanide layer.
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Abstract
A method of making a nonvolatile memory device includes fabricating a diode in a low resistivity, programmed state without an electrical programming step. The memory device includes at least one memory cell. The memory cell is constituted by the diode and electrically conductive electrodes contacting the diode.
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Citations
21 Claims
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1. A method of making a diode, comprising:
forming a first electrode;
forming a semiconductor region in electrical contact with the first electrode, wherein the semiconductor region comprises a p-n or a p-i-n junction in at least one silicon, germanium or silicon-germanium layer;
forming a titanium layer on the semiconductor region;
forming a titanium nitride layer on the titanium layer;
reacting the titanium layer with the semiconductor region to form a titanium silicide, titanium germanide, or titanium silicide-germanide layer on the semiconductor region;
removing the titanium nitride layer and a remaining portion of the titanium layer after the step of reacting; and
forming a second electrode in electrical contact with the titanium silicide, titanium germanide or titanium silicide-germanide layer;
wherein the titanium silicide, titanium germanide or titanium silicide-germanide layer comprises a C49 phase titanium silicide, a C49 phase titanium germanide or a C49 phase titanium silicide-germanide layer.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of making a nonvolatile memory device comprising at least one memory cell which consists essentially of a diode and electrically conductive electrodes contacting the diode, the method comprising:
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fabricating the diode in a stable low resistivity, programmed state corresponding to a first memory state of the memory cell without an electrical programming step, wherein the step of fabricating the diode in the stable low resistivity, programmed state comprises; forming a high resistivity amorphous or polycrystalline silicon, germanium or silicon-germanium diode; forming a C49 phase titanium silicide, C49 phase titanium germanide or C49 phase titanium silicide-germanide layer in contact with the high resistivity diode; and crystallizing the amorphous or polycrystalline diode to the low resistivity state using the titanium silicide, titanium germanide or titanium silicide-germanide layer as a crystallization template. - View Dependent Claims (16, 17)
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18. A method of operating a diode memory cell, comprising:
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providing the diode which is fabricated in a stable low resistivity, programmed state corresponding to a first memory state of the memory cell without an electrical programming step; applying a reverse bias greater than a predetermined critical voltage value to the diode to switch the diode to a high resistivity, unprogrammed state corresponding to a second memory state of the memory cell; and applying a forward bias to the diode to switch the diode to the low resistivity, programmed state; wherein the step of providing the diode which is fabricated in the stable low resistivity programmed state comprises; forming a high resistivity amorphous or polycrystalline silicon, germanium or silicon-germanium diode;
forming a C49 phase titanium silicide, C49 phase titanium germanide or C49 phase titanium silicide-germanide layer in contact with the high resistivity diode; andcrystallizing the amorphous or polycrystalline diode to the low resistivity state using the titanium silicide, titanium germanide or titanium silicide-germanide layer as a crystallization template. - View Dependent Claims (19, 20, 21)
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Specification