Coupling apparatus, exposure apparatus, and device fabricating method
First Claim
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1. An exposure apparatus that exposes a substrate via a liquid, comprising:
- a projection optical system that has a first group including an optical member that contacts said liquid, and a second group that differs from said first group;
a substrate stage that moves while holding said substrate;
a first support member that supports said first group;
a second support member that supports said second group and is different from said first support member; and
a measuring apparatus that measures a positional relationship between said first group and said second group,wherein said substrate stage is movable with respect to said optical member while said optical member contacts said liquid.
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Abstract
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.
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Citations
54 Claims
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1. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a projection optical system that has a first group including an optical member that contacts said liquid, and a second group that differs from said first group; a substrate stage that moves while holding said substrate; a first support member that supports said first group; a second support member that supports said second group and is different from said first support member; and a measuring apparatus that measures a positional relationship between said first group and said second group, wherein said substrate stage is movable with respect to said optical member while said optical member contacts said liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 50, 51, 52, 53, 54)
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13. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a projection optical system that has a first group including an optical member that contacts said liquid, and a second group disposed between said first group and a pattern; a first holding member that holds said first group; a second holding member that holds said second group isolated from said first holding member; and a frame member that supports said first holding member and said second holding member. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
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39. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a projection optical system that has a first group including an optical member that contacts said liquid, and a second group disposed between said first group and a pattern; a first holding member that holds said first group; a second holding member that holds said second group isolated from said first holding member; a frame member that supports said first holding member; and a linking mechanism that has a vibration isolating mechanism that suppresses the vibrations of at least one of said first holding member and said frame member, and that links said first holding member and said frame member. - View Dependent Claims (40, 41, 42, 43, 44, 45)
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46. An exposure apparatus that exposes a substrate via a liquid comprising:
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a liquid immersion mechanism that forms an immersion area in only one part of said substrate during exposure of said substrate; a projection optical system that has a first group including an optical member that contacts said liquid, and a second group disposed between said first group and a pattern; and a support mechanism that supports said first group and said second group in a state in which said first group and said second group are vibrationally isolated from each other, wherein said substrate is movable with respect to said optical member while said substrate is exposed. - View Dependent Claims (47, 48, 49)
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Specification
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Current AssigneeNikon Corporation
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Original AssigneeNikon Corporation
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InventorsOno, Kazuya, Shibazaki, Yuichi
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Primary Examiner(s)NGUYEN, HUNG
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Application NumberUS11/322,125Publication NumberTime in Patent Office1,418 DaysField of Search355/30, 355/67, 355/53, 355/71, 355 72- 76, 378/34, 378/35, 250/492.1, 250/492.2, 250/548US Class Current355/53CPC Class CodesG03F 7/70341 Details of immersion lithog...G03F 7/70833 Mounting of optical systems...
