Source optimization for image fidelity and throughput
First Claim
1. A computer-readable medium storing a sequence of instructions that when executed by a computer causes the computer to perform a method, the method comprising:
- receiving a layout pattern defining a desired pattern of features to be created on a wafer by a photolithographic process;
generating a desired light source distribution for the desired pattern of features, the desired light source distribution representing a light source distribution that reduces printing errors caused by the photolithographic process when printing the desired pattern of features; and
generating a modified layout pattern using the desired light source distribution, the modified layout pattern defining a corrected version of the desired pattern of features that further reduces printing errors caused by the photolithographic process when used to define a mask layout used during the printing of the desired pattern of features.
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Accused Products
Abstract
A system and method for optimizing an illumination source to print a desired pattern of features dividing a light source into pixels and determining an optimum intensity for each pixel such that when the pixels are simultaneously illuminated, the error in a printed pattern of features is minimized. In one embodiment, pixel solutions are constrained from solutions that are bright, continuous, and smooth. In another embodiment, the light source optimization and resolution enhancement technique(s) are iteratively performed to minimize errors in a printed pattern of features.
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Citations
34 Claims
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1. A computer-readable medium storing a sequence of instructions that when executed by a computer causes the computer to perform a method, the method comprising:
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receiving a layout pattern defining a desired pattern of features to be created on a wafer by a photolithographic process; generating a desired light source distribution for the desired pattern of features, the desired light source distribution representing a light source distribution that reduces printing errors caused by the photolithographic process when printing the desired pattern of features; and generating a modified layout pattern using the desired light source distribution, the modified layout pattern defining a corrected version of the desired pattern of features that further reduces printing errors caused by the photolithographic process when used to define a mask layout used during the printing of the desired pattern of features. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A computer-readable medium storing a sequence of instructions that when executed by a computer causes the computer to perform a method, the method comprising:
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receiving a layout pattern, the layout pattern defining a desired pattern of features to be created on a wafer by a photolithographic process; generating a modified layout pattern from the layout pattern, the modified layout pattern defining a corrected version of the desired pattern of features that reduces printing errors when used to define a mask layout used during the printing of the desired pattern of features; and generating a desired light source distribution for the corrected version of the desired pattern of features, the desired light source distribution representing a light source distribution that further reduces printing errors caused by the photolithographic process when printing the desired pattern of features. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A computer-readable medium storing a sequence of instructions that when executed by a computer causes the computer to perform a method, the method comprising:
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receiving all or a portion of layout data, the layout data defining a desired pattern of features to be created on a wafer using a photolithographic process; and generating a representation of a diffractive optical element for use in producing the desired pattern of features, the representation of the diffractive optical element being generated by representing a light source used during the photolithographic process as a number of light source pixels and determining intensity values for the light source pixels using a representation of the desired pattern of features. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A computer-implemented method, comprising:
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receiving a layout pattern defining a desired pattern of features to be created on a wafer by a photolithographic process; generating a desired light source distribution for the desired pattern of features, the desired light source distribution representing a light source distribution that reduces printing errors caused by the photolithographic process when printing the desired pattern of features; and generating a modified layout pattern using the desired light source distribution, the modified layout pattern defining a corrected version of the desired pattern of features that further reduces printing errors caused by the photolithographic process when used to define a mask layout used during the printing of the desired pattern of features; and storing the modified layout pattern in a computer-readable medium. - View Dependent Claims (27, 28, 29)
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30. A computer-implemented method, comprising:
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receiving a layout pattern, the layout pattern defining a desired pattern of features to be created on a wafer by a photolithographic process; generating a modified layout pattern from the layout pattern, the modified layout pattern defining a corrected version of the desired pattern of features that reduces printing errors when used to define a mask layout used during the printing of the desired pattern of features; generating a desired light source distribution for the corrected version of the desired pattern of features, the desired light source distribution representing a light source distribution that further reduces printing errors caused by the photolithographic process when printing the desired pattern of features; and storing the desired light source distribution in a computer-readable medium. - View Dependent Claims (31, 32, 33)
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34. A computer-implemented method, comprising:
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receiving all or a portion of layout data, the layout data defining a desired pattern of features to be created on a wafer using a photolithographic process; generating a representation of a diffractive optical element for use in producing the desired pattern of features, the representation of the diffractive optical element being generated by representing a light source used during the photolithographic process as a number of light source pixels and determining intensity values for the light source pixels using a representation of the desired pattern of features; and storing the representation of the diffractive optical element in a computer-readable medium.
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Specification