Split-phase chamber modeling for chamber matching and fault detection
First Claim
Patent Images
1. A method for thin-film process chamber data analysis, the method comprising:
- a) acquiring chamber data;
b) defining an adjustment portion of the chamber data and a steady-state portion of the chamber data;
c) forming a chamber model having an adjustment portion and a steady-state portion; and
d) using the chamber model performing at least one of;
1) providing a user identifiable indication;
or
2) performing a chamber adjustment.
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Abstract
In at least one embodiment, the present invention is a method for thin-film process chamber data analysis, which includes acquiring chamber data, defining an adjustment portion of the chamber data and a steady-state portion of the chamber data, and forming a chamber model having an adjustment portion and a steady-state portion. The method can further include comparing the chamber model with a subject chamber to provide a chamber data comparison and utilizing the chamber data comparison.
20 Citations
34 Claims
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1. A method for thin-film process chamber data analysis, the method comprising:
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a) acquiring chamber data; b) defining an adjustment portion of the chamber data and a steady-state portion of the chamber data; c) forming a chamber model having an adjustment portion and a steady-state portion; and d) using the chamber model performing at least one of;
1) providing a user identifiable indication;
or
2) performing a chamber adjustment. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 33)
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18. A split-phase chamber analysis method comprising:
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a) executing a process run having at least one phase of operation; b) measuring at least one chamber variable during the at least one phase of operation to form chamber data; c) separating the chamber data into at least one adjustment portion and at least one steady-state portion for each of the at least one phase of operation; e) performing a multivariate analysis on the at least one adjustment portion and the at least one steady-state portion of the chamber data; and f) using results from the multivariate analysis performing at least one of;
1) providing a user identifiable indication;
or
2) performing a chamber adjustment. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 34)
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29. A thin-film chamber analysis method for chamber matching comprising:
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a) acquiring chamber model data from more than one known chamber; b) defining a transition portion and a steady-state portion of at least one process phase of the chamber model data; c) performing a multivariate analysis to form a chamber model with a transition portion and a steady-state portion; d) comparing the chamber model with a subject chamber during an offline analysis; and e) adjusting the subject chamber in response to the comparing of the chamber model with the subject chamber.
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30. A thin-film chamber analysis method for fault detection comprising:
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a) acquiring chamber model data from more than one run of a chamber; b) defining a transition portion and a steady-state portion of at least one process phase of the chamber model data; c) performing a multivariate analysis to form a chamber model with a transition portion and a steady-state portion; d) comparing the chamber model with a subject process run of the chamber; and e) providing a user identifiable indication based on results of the comparing the chamber model with the subject process run. - View Dependent Claims (31, 32)
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Specification