Radiation pulse energy control system, lithographic apparatus and device manufacturing method

• US 7,626,182 B2
• Filed: 09/05/2006
• Issued: 12/01/2009
• Est. Priority Date: 09/05/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Noordman, Oscar Franciscus Jozephus
• Primary Examiner(s): Vanore; David A.
• Assistant Examiner(s): Johnston; Phillip A.
• Application Number:
  US11/515,378
• Publication Number:
  US 20080054190A1
• Time in Patent Office: 1,183 Days
• Field of Search: 250/492.2
• US Class Current: 250/492.2
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/7055 Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A system for controlling the energy of radiation pulses. A detector monitors energy of the pulses and an optical shutter trims the radiation pulses after a suitable optical delay line. The accuracy of the control of the energy of the radiation pulses can be improved by matching a rate of response of the radiation detector to a rate of response of the optical shutter.

Claims

1. A radiation pulse energy control system configured to control energy in a pulse of radiation passing through the system, comprising:

a radiation detector that is configured to monitor the energy in the pulse of radiation; and

an optical shutter that is configured to close in response to the radiation detector in order to trim part of the pulse of radiation passing through the system,

wherein the radiation detector is configured such that a speed of response of the radiation detector equals a speed of response of the optical shutter.

2. The radiation pulse energy control system of claim 1, wherein the radiation detection is configured to produce a step response curve and the optical shutter is configured to produce a step response curve, such that the step response of the radiation detector substantially matches the step response of the optical shutter inverted in time.

3. The radiation pulse energy control system of claim 1, further comprising:

a controller that is configured to control the energy of the pulse of radiation passing through the system to be a given energy level, wherein the controller is configured to trigger the optical shutter to close when it is determined that the total energy in the pulse that has reached the radiation detector is the given energy level.

4. The radiation pulse energy control system of claim 1, wherein an amount of time taken for the shutter to close is greater than a duration of the pulse of radiation passing through the system.

5. The radiation pulse energy control system of claim 1, wherein the optical shutter comprises at least one of a Pockels cell and an interferometer.

6. The radiation pulse energy control system of claim 1, further comprising:

an optical delay line configured to delay the pulse of radiation passing through the system after the radiation detector has monitored the energy of the pulse and before the pulse reaches the optical shutter.

7. A laser, comprising:

a radiation detector that is configured to monitor energy in a pulse of radiation; and

an optical shutter that is configured to close in response to the radiation detector in order to trim part of the pulse of radiation passing through the system,

wherein the radiation detector is configured such that a speed of response of the radiation detector equals a speed of response of the optical shutter.

8. A lithographic apparatus, comprising:

an illuminator configured to condition a pulsed beam of radiation;

a radiation pulse energy control system configured to control energy in the pulse of radiation passing through the system, the radiation pulse energy control system comprising

a radiation detector that is configured to monitor energy in a pulse of radiation, and

an optical shutter that is configured to close in response to the radiation detector in order to trim part of the pulse of radiation passing through the system,

wherein the radiation detector is configured such that a speed of response of the radiation detector equals a speed of response of the optical shutter;

a patterning device configured to pattern the pulse of radiation leaving the shutter; and

a projection system configured to project the patterned beam onto a target portion of a substrate.

9. A device manufacturing method including modulating a pulsed beam of radiation and projecting the modulated beam onto a substrate, the method comprising:

monitoring energy in the pulse of radiation using a radiation detector; and

trimming the pulse of radiation through closure of an optical shutter,

wherein a speed of response of the radiation detector is equal to a speed of response of the optical shutter.

10. An integrated circuit device manufactured according to the method of claim 9.

11. A flat panel display manufactured according to the method of claim 9.