Lithographic apparatus with multiple alignment arrangements and alignment measuring method
First Claim
1. A lithographic apparatus, comprising:
- a first alignment arrangement comprising a first detector configured to detect by a first alignment measurement a first alignment mark on an object and to produce a first alignment signal, wherein the first alignment arrangement comprises a first light source configured to produce a first light beam;
a second alignment arrangement using a second alignment measurement different than the first alignment arrangement and comprising a second detector arranged to detect the first mark and to produce a second alignment signal, wherein the second alignment arrangement comprises a second light source configured to produce a second light beam; and
a processor connected to the first detector and to the second detector, and configured to;
receive the first alignment signal from the first detector;
calculate a position of the first mark based on the first alignment signal;
receive the second alignment signal from the second detector;
calculate a further first position of the first mark based on the second alignment signal; and
combine the position of the first mark and the further position of the first mark to calculate a calculated position of the first mark.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further first position of the at least first mark based on the second alignment signal.
-
Citations
25 Claims
-
1. A lithographic apparatus, comprising:
-
a first alignment arrangement comprising a first detector configured to detect by a first alignment measurement a first alignment mark on an object and to produce a first alignment signal, wherein the first alignment arrangement comprises a first light source configured to produce a first light beam; a second alignment arrangement using a second alignment measurement different than the first alignment arrangement and comprising a second detector arranged to detect the first mark and to produce a second alignment signal, wherein the second alignment arrangement comprises a second light source configured to produce a second light beam; and a processor connected to the first detector and to the second detector, and configured to; receive the first alignment signal from the first detector; calculate a position of the first mark based on the first alignment signal; receive the second alignment signal from the second detector; calculate a further first position of the first mark based on the second alignment signal; and combine the position of the first mark and the further position of the first mark to calculate a calculated position of the first mark. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A lithographic apparatus, comprising:
-
a first alignment arrangement comprising a first light source and a first detector configured to detect a first alignment mark located on an object and to produce a first alignment signal; a second alignment arrangement comprising a second light source and a second detector configured to detect a second alignment mark on the object and to produce a second alignment signal; a processor connected to the first detector and to the second detector, and configured to; receive the first alignment signal from the first detector; calculated a position of the first mark based on the first alignment signal; receive the second alignment signal from the second detector; calculate a position of the second mark based on the second alignment signal; combine the position of the first mark and the position of the second mark to calculate a calculated position while using at least one weighting factor on either the position of the first mark or the position of the second mark, the weighting factor being determined by an indicator. - View Dependent Claims (15, 16, 17, 18)
-
-
19. An alignment measurement method, comprising:
-
detecting by a first alignment measurement at least a first alignment mark located on an object and producing a first alignment signal by a first detector, wherein the first alignment measurement comprises generating from a first light source a first light beam; detecting the first mark and producing a second alignment signal by a second detector using a second alignment measurement different than the first detector; receiving the first alignment signal from the first detector, wherein the second alignment measurement comprises generating from a second light source a second light beam; calculating a position of the first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further position of the at least first mark based on the second alignment signal; and combining the position of the first mark and the further position of the first mark to calculate a calculated position of the first mark. - View Dependent Claims (20, 21)
-
-
22. An alignment measurement method, comprising:
-
detecting first alignment mark located on an object and producing a first alignment signal by a first detector using a first beam of light generated from a first light source; detecting a second mark on the object and producing a second alignment signal by a second detector using a second beam of light generated from a second light source; receiving the first alignment signal from the first detector; calculating a position of the first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a position of the second mark based on the second alignment signal; and combining the position of the first mark and the position of the second mark to calculate a calculated position while using at least one weighting factor on either the position of the first mark or the position of the second mark, the weighting factor being determined by an indicator. - View Dependent Claims (23)
-
-
24. A machine-readable storage medium comprising machine executable instructions to be loaded by a processor of a lithographic apparatus, and configured to instruct the lithographic apparatus to perform an alignment measurement method comprising:
-
detecting by a first alignment measurement a first alignment mark located on an object and producing a first alignment signal by a first detector using a first beam of light generated from a first light source; detecting the first mark and producing a second alignment signal by a second detector using a second alignment measurement different than the first detector using a second beam of light generated from a second light source; receiving the first alignment signal from the first detector; calculating a position of the first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further position of the at least first mark based on the second alignment signal; and combining the position of the first mark and the further position of the first mark to calculate a calculated position of the first mark.
-
-
25. A machine-readable storage medium comprising machine executable instructions to be loaded by a processor of a lithographic apparatus, and configured to instruct the lithographic apparatus to perform an alignment measurement method comprising:
-
detecting a first alignment mark located on an object and producing a first alignment signal by a first detector using a first beam of light generated from a first light source; detecting a second mark on the object and producing a second alignment signal by a second detector using a first beam of light generated from a first light source; receiving the first alignment signal from the first detector; calculating a position of the first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a position of the second mark based on the second alignment signal; and combining the position of the first mark and the position of the second mark to calculate a calculated position while using at least one weighting factor on either the position of the first mark or the position of the second mark, the weighting factor being determined by an indicator.
-
Specification