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Photomask, method of making a photomask and photolithography method and system using the same

  • US 7,629,087 B2
  • Filed: 05/23/2006
  • Issued: 12/08/2009
  • Est. Priority Date: 06/15/2005
  • Status: Expired due to Fees
First Claim
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1. A photomask, comprising:

  • a substrate having a first surface, a second surface, a first region between the first surface and second surface and a second region between the first surface and second surface;

    a polarizing structure formed in the first surface of the substrate in one of the first and second regions, such that when radiation of a first illumination type impinges on the substrate and the polarizing structure, radiation of a second illumination type, which is polarized, is formed in the one of the first and second regions and radiation of a third illumination type is formed in the other of the first and second regions; and

    a pattern formed on the substrate;

    wherein the polarizing structure is formed on a chrome side of the substrate.

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