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Reverse side film laser circuit etching

  • US 7,633,035 B2
  • Filed: 10/05/2006
  • Issued: 12/15/2009
  • Est. Priority Date: 10/05/2006
  • Status: Expired due to Fees
First Claim
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1. A method for etching metal on a substrate, comprising:

  • placing a laminated sheet of metal and dielectric substrate in a vacuum;

    directing a beam from a laser, also disposed in said vacuum, at the laminated sheet from the side of its dielectric substrate;

    causing said laser beam to pass through said dielectric substrate and to ablate portions of said metal from underneath; and

    using two beams from separate lasers wherein one is tuned to ablate wide field areas of metal and the other laser is optimized for scribing fine lines and features, and wherein the two lasers are coordinated to provide a single result.

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