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System and method for providing residual stress test structures

  • US 7,636,151 B2
  • Filed: 06/15/2006
  • Issued: 12/22/2009
  • Est. Priority Date: 01/06/2006
  • Status: Expired due to Fees
First Claim
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1. A test unit configured to indicate residual stress in a deposited film, wherein the test unit is configured to interferometrically modulate light indicative of average residual stress in two orthogonal directions of the film.

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