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Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus

  • US 7,642,038 B2
  • Filed: 03/22/2005
  • Issued: 01/05/2010
  • Est. Priority Date: 03/24/2004
  • Status: Active Grant
First Claim
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1. A method for forming a pattern, comprising the steps of:

  • forming a mask over a light-transmitting substrate;

    forming a first region including a photocatalyst over the light-transmitting substrate and the mask;

    forming a material containing a fluorocarbon chain over the photocatalyst;

    irradiating the photocatalyst and the material containing the fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a second region; and

    discharging a conductive composition containing a pattern forming material to the second region to form a pattern,wherein the mask does not transmit the light.

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