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Large field of view projection optical system with aberration correctability

  • US 7,643,128 B2
  • Filed: 12/28/2006
  • Issued: 01/05/2010
  • Est. Priority Date: 06/30/2003
  • Status: Active Grant
First Claim
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1. An exposure system, comprising:

  • a reticle with patterns on it;

    a substrate; and

    a reflective optical system configured to image the patterns on the reticle onto the substrate, components of the reflective optical system comprising;

    a primary mirror including a first mirror and a second mirror, anda secondary mirror,wherein relative positions of the first and second mirrors of the reflective optical system are adjustable post-design, andwherein the optical system provides at least ten (10) degrees of freedom for both alignment and correction of aberrations without incorporating additional optical surfaces, when projecting an image of the patterns on the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

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