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Systems and methods for drying a rotating substrate

  • US 7,644,512 B1
  • Filed: 01/18/2007
  • Issued: 01/12/2010
  • Est. Priority Date: 01/18/2006
  • Status: Active Grant
First Claim
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1. A method of drying a surface of a substrate comprising;

  • a) supporting a substrate;

    b) rotating the substrate;

    c) applying a liquid to the surface of the substrate at a rotational center point via a liquid dispenser so that a film of the liquid is formed on the surface of the substrate;

    d) applying a drying fluid to the surface of the substrate at a distance from the rotational center point via a drying fluid dispenser;

    e) manipulating the drying fluid dispenser so that the location at which the drying fluid is applied to the surface of the substrate is moved in a direction toward the rotational center point; and

    f) manipulating the liquid dispenser so that the location at which the liquid is applied to the surface of the substrate is moved in a direction outward from the rotational center point while performing step e).

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