×

Showerhead electrode assembly for plasma processing apparatuses

  • US 7,645,341 B2
  • Filed: 12/23/2003
  • Issued: 01/12/2010
  • Est. Priority Date: 12/23/2003
  • Status: Active Grant
First Claim
Patent Images

1. A showerhead electrode assembly of a semiconductor substrate processing apparatus, comprising:

  • a top plate;

    a showerhead electrode comprising a plate;

    a backing plate including a bottom surface attached to an upper surface of the plate;

    a thermal control plate including a central portion, an outer portion and a flexure portion extending from and connecting the outer portion to the central portion, the central portion being attached to a top surface of the backing plate and to the top plate such that the central portion of the thermal control plate is movable relative to the top plate, the outer portion being attached to the top plate, and the flexure portion being configured to accommodate differential thermal expansion between the top plate and the thermal control plate;

    a heater on the central portion of the thermal control plate adapted to heat the thermal control plate; and

    at least two laterally spaced apart thermal bridges between the central portion of the thermal control plate and the top plate, the thermal bridges providing a thermal and electrical path between the showerhead electrode and the top plate.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×