Computer-implemented methods for detecting defects in reticle design data
First Claim
1. A computer-implemented method for detecting defects in reticle design data, comprising:
- using a computer system to perform steps of;
generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process;
generating second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process; and
detecting defects in the reticle design data using the second simulated images without fabricating the reticle.
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Abstract
Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.
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Citations
22 Claims
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1. A computer-implemented method for detecting defects in reticle design data, comprising:
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using a computer system to perform steps of; generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process; generating second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process; and detecting defects in the reticle design data using the second simulated images without fabricating the reticle. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A system configured to detect defects in reticle design data, comprising:
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a simulation engine configured to; generate a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process; and generate second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process; and a processor configured to detect defects in the reticle design data using the second simulated images without fabrication of the reticle.
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20. A computer-implemented method for detecting defects in reticle design data, comprising:
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using a computer system to perform steps of; generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process; generating second simulated images using the first simulated image, wherein the second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process; determining a rate of change in a characteristic of the second simulated images as a function of the different values; and detecting defects in the reticle design data based on the rate of change without fabricating the reticle. - View Dependent Claims (21)
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22. A computer-implemented method for detecting defects in reticle design data printed on a reticle, comprising:
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printing images of the reticle on a wafer at different values of one or more parameters of a wafer printing process; using a computer system to perform steps of; determining a rate of change in a characteristic of the images as a function of the different values; and detecting defects in the reticle design data based on the rate of change.
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Specification