Multilayer barrier stacks and methods of making multilayer barrier stacks
First Claim
1. A barrier stack made by the process of:
- depositing a polymeric decoupling layer on a substrate;
depositing a first inorganic layer on the polymeric decoupling layer under a first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that the first inorganic layer is not a barrier layer, wherein a temperature of the substrate is less than about 150°
C.; and
depositing a second inorganic layer on the first inorganic layer under a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that the second inorganic layer is a barrier layer.
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Abstract
An improved barrier stack. The barrier stack is made by the process of depositing the polymeric decoupling layer on a substrate; depositing a first inorganic layer on the decoupling layer under a first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that the first inorganic layer is not a barrier layer, wherein a temperature of the substrate is less than about 150° C.; and depositing a second inorganic layer on the first inorganic layer under a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that the second inorganic layer is a barrier layer. Methods of reducing damage to a polymeric layer in a barrier stack are also described.
345 Citations
29 Claims
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1. A barrier stack made by the process of:
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depositing a polymeric decoupling layer on a substrate; depositing a first inorganic layer on the polymeric decoupling layer under a first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that the first inorganic layer is not a barrier layer, wherein a temperature of the substrate is less than about 150°
C.; anddepositing a second inorganic layer on the first inorganic layer under a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that the second inorganic layer is a barrier layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A barrier stack made by the process of:
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depositing a polymeric decoupling layer on a substrate; depositing an inorganic layer on the polymeric decoupling layer at first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that a first portion of the inorganic layer adjacent to the polymeric decoupling layer is not a barrier layer, wherein a temperature of the substrate is less than about 150°
C., and changing to a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that a second portion of the inorganic layer is a barrier layer. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A method of reducing damage to a polymeric decoupling layer in a barrier stack comprising:
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depositing the polymeric decoupling layer on a substrate; depositing a first inorganic layer on the polymeric decoupling layer under a first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that the first inorganic layer is not a barrier layer, wherein a temperature of the substrate is less than about 150°
C.; anddepositing a second inorganic layer on the first inorganic layer under a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that the second inorganic layer is a barrier layer. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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26. A method of reducing damage to a polymeric decoupling layer in a barrier stack comprising:
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depositing the polymeric decoupling layer on a substrate; depositing an inorganic layer on the decoupling layer at first set of conditions wherein an ion and neutral energy arriving at the substrate is less than about 20 eV so that a first portion of the inorganic layer adjacent to the polymeric decoupling layer is not a barrier layer, wherein a temperature of the substrate is less than about 150°
C., and changing to a second set of conditions wherein an ion and neutral energy arriving at the substrate is greater than about 50 eV so that a second portion of the inorganic layer is a barrier layer. - View Dependent Claims (27, 28)
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29. A method of reducing damage to a polymeric decoupling layer in a barrier stack comprising:
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depositing the polymeric decoupling layer on a substrate; placing a screen between a target and the substrate; plasma depositing a first inorganic layer on the polymeric decoupling layer under conditions so that the first inorganic layer is not a barrier layer; and plasma depositing a second inorganic layer on the first inorganic layer so that the second inorganic layer is a barrier layer.
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Specification