Electrostatic chuck assembly
First Claim
1. An electrostatic chuck base, comprising:
- an electrostatic chuck base body having an inner cooling channel and an outer cooling channel formed within the body, wherein the outer cooling channel is substantially encircling the inner cooling channel, and one or more first grooves are coupled with and extending from the inner cooling channel, and one or more second grooves are coupled with and extending from the outer cooling channel.
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Accused Products
Abstract
The present invention generally comprises an electrostatic chuck base, an electrostatic chuck assembly, and a puck for the electrostatic chuck assembly. Precisely etching a substrate within a plasma chamber may be a challenge because the plasma within the chamber may cause the temperature across the substrate to be non-uniform. A temperature gradient may exist across the substrate such that the edge of the substrate is at a different temperature compared to the center of the substrate. When the temperature of the substrate is not uniform, features may not be uniformly etched into the various layers of the structure disposed above the substrate. A dual zone electrostatic chuck assembly may compensate for temperature gradients across a substrate surface.
80 Citations
19 Claims
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1. An electrostatic chuck base, comprising:
an electrostatic chuck base body having an inner cooling channel and an outer cooling channel formed within the body, wherein the outer cooling channel is substantially encircling the inner cooling channel, and one or more first grooves are coupled with and extending from the inner cooling channel, and one or more second grooves are coupled with and extending from the outer cooling channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A puck for an electrostatic chuck assembly, comprising:
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a puck body; and a plurality of mesas arranged across the puck body in at least two different patterns, wherein the at least two different patterns comprise at least a first inner pattern in a substantially linear arrangement across a face of the puck and at least a second outer pattern having one or more rows encircling the first inner pattern. - View Dependent Claims (10, 11)
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12. An electrostatic chuck assembly, comprising:
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a puck, the puck comprising; a puck body; and a plurality of mesas arranged across the puck body in at least two different patterns, wherein the at least two different patterns comprise at least a first inner pattern in a substantially linear arrangement across a face of the puck and at least a second outer pattern having one or more rows encircling the first inner pattern; and an electrostatic chuck base body disposed adjacent the puck, the electrostatic chuck base body having an inner cooling channel and an outer cooling channel formed within the body, wherein the outer cooling channel is substantially encircling the inner cooling channel, and one or more first grooves are coupled with and extending from the inner cooling channel, and one or more second grooves are coupled with and extending from the outer cooling channel. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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Specification