Electronic device including trenches and discontinuous storage elements and processes of forming and using the same
First Claim
1. A process of forming an electronic device comprising:
- forming a first trench within a substrate, wherein the first trench extends from a primary surface of the substrate and has a first wall and a first bottom;
forming discontinuous storage elements over the primary surface and within the first trench;
forming a first gate electrode within the first trench and adjacent to the first wall and overlying the first bottom of the first trench;
forming a second gate electrode within the first trench and adjacent to the first gate electrode and overlying the first bottom of the first trench; and
removing a portion of the discontinuous storage elements to form a first set of discontinuous storage elements, wherein the first set of the discontinuous storage elements lies between (i) the first gate electrode or the second gate electrode and (ii) the first bottom of the first trench.
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Accused Products
Abstract
An electronic device can include a substrate including a first trench having a first bottom and a first wall. The electrode device can also include a first gate electrode within the first trench and adjacent to the first wall and overlying the first bottom of the first trench, and a second gate electrode within the first trench and adjacent to the first gate electrode and overlying the first bottom of the first trench. The electronic device can further include discontinuous storage elements including a first set of discontinuous storage elements, wherein the first set of the discontinuous storage elements lies between (i) the first gate electrode or the second gate electrode and (ii) the first bottom of the first trench. Processes of forming and using the electronic device are also described.
113 Citations
20 Claims
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1. A process of forming an electronic device comprising:
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forming a first trench within a substrate, wherein the first trench extends from a primary surface of the substrate and has a first wall and a first bottom; forming discontinuous storage elements over the primary surface and within the first trench; forming a first gate electrode within the first trench and adjacent to the first wall and overlying the first bottom of the first trench; forming a second gate electrode within the first trench and adjacent to the first gate electrode and overlying the first bottom of the first trench; and removing a portion of the discontinuous storage elements to form a first set of discontinuous storage elements, wherein the first set of the discontinuous storage elements lies between (i) the first gate electrode or the second gate electrode and (ii) the first bottom of the first trench. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification