Optically oriented three-dimensional polymer microstructures

• US 7,653,279 B1
• Filed: 05/29/2008
• Issued: 01/26/2010
• Est. Priority Date: 10/13/2006
• Status: Active Grant

• Current Assignee: HRL Laboratories LLC (The Boeing Co.)
• Original Assignee: HRL Laboratories LLC (The Boeing Co.)
• Inventors: Jacobsen, Alan J.
• Primary Examiner(s): Wong; Tina M
• Assistant Examiner(s): Prince; Kajli
• Application Number:
  US12/156,380
• Time in Patent Office: 607 Days
• Field of Search: 385/129
• US Class Current: 385/129
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 1/005 made of photonic crystals or photonic band gap materials photonic band-gap structures or photonic lattices in integrated optics G02B6/1225; photonic band-gap structures or photonic lattices in optical fibres G02B6/02295
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G02B 6/1225 comprising photonic band-gap structures or photonic lattices
• CPC Class Codes: G02B 6/138 by using polymerisation
• CPC Class Codes: G03F 7/0005 Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
• CPC Class Codes: G03F 7/0037 Production of three-dimensional images
• CPC Class Codes: G03F 7/201 characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
• CPC Class Codes: G03F 7/2012 using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

Abstract

A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height and including a plurality of waveguides that can be formed utilizing a mask and collimated light. The plurality of waveguides includes a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction and a third waveguide having a third finite propagation distance extended along a third direction. Here, only one of the length, width and height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

Claims

1. A three-dimensional (3D) ordered polymer microstructure having first, second and third dimensions, the 3D ordered polymer microstructure comprising:

a plurality of waveguides comprising;

a first waveguide having a first finite propagation distance extended along a first direction,

a second waveguide having a second finite propagation distance extended along a second direction, and

a third waveguide having a third finite propagation distance extended along a third direction,

wherein;

each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides; and

the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization.

2. The 3D ordered polymer microstructure of claim 1, wherein the plurality of waveguides are formed by a plurality of collimated light beams directed through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams.

3. The 3D ordered polymer microstructure of claim 2, wherein two dimensions of the first, second and third dimensions of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

4. The 3D ordered polymer microstructure of claim 3, wherein the two dimensions not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide correspond to the 2D exposure surface.

5. The 3D ordered polymer microstructure of claim 1, wherein two dimensions of the first, second and third dimensions of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

6. The 3D ordered polymer microstructure of claim 1, wherein the waveguide intersections have substantially constant cross-sectional dimensions.

7. A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height, the 3D ordered polymer microstructure comprising:

a plurality of waveguides comprising;

a first waveguide having a first finite propagation distance extended along a first direction,

a second waveguide having a second finite propagation distance extended along a second direction, and

a third waveguide having a third finite propagation distance extended along a third direction,

wherein;

each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides;

each of the second waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and third waveguides; and

the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization.

8. The 3D ordered polymer microstructure of claim 7, wherein the plurality of waveguides are formed by a plurality of collimated light beams through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams.

9. The 3D ordered polymer microstructure of claim 8, wherein the two dimensions not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide correspond to the 2D exposure surface.

10. A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height, the 3D ordered polymer microstructure comprising:

a plurality of waveguides comprising;

a first waveguide having a first finite propagation distance extended along a first direction,

a second waveguide having a second finite propagation distance extended along a second direction, and

a third waveguide having a third finite propagation distance extended along a third direction,

wherein;

each of the first waveguides defines a non-perpendicular angle with at least one waveguide selected from the second and third waveguides;

each of the second waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and third waveguides;

each of the third waveguides defines a non-perpendicular angle with at least one waveguide selected from the first and second waveguides; and

the first, second and third waveguides are coupled at waveguide intersections unperturbed by changes in index of refraction caused by photopolymerization.

11. The 3D ordered polymer microstructure of claim 10, wherein the plurality of waveguides are formed by a plurality of collimated light beams through a plurality of apertures on a mask having a two-dimensional (2D) pattern and onto a two-dimensional (2D) exposure surface of a volume of photo-monomer adapted to polymerize by the collimated light beams.

12. The 3D ordered polymer microstructure of claim 11, wherein only the height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

13. The 3D ordered polymer microstructure of claim 11, wherein the length and width of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

14. The 3D ordered polymer microstructure of claim 13, wherein the length and width of the 3D ordered polymer microstructure correspond to the 2D exposure surface.

15. The 3D ordered polymer microstructure of claim 10, wherein only the height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

16. The 3D ordered polymer microstructure of claim 10, wherein the length and width of the 3D ordered polymer microstructure are not limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.