Apparatus and method for detecting displacement of a movable member of an electronic musical instrument
First Claim
1. A sensor device operable with a force applying member, the sensor device comprising:
- a substrate including a base material on which a first metal pattern and a second metal pattern are disposed; and
a base film, located at least partially between the force applying member and the substrate, comprising;
a resistive pattern; and
a spacer film having one or more openings in a first area between a first part of the resistive pattern and the first metal pattern and in a second area between a second part of the resistive pattern and the second metal pattern;
wherein the base film is configured to receive a force from the force applying member to cause at least a portion of the first part of the resistive pattern to contact at least a portion of the first metal pattern and to cause at least a portion of the second part of the resistive pattern to contact at least a portion of the second metal pattern.
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Accused Products
Abstract
An apparatus for detecting the displacement of a movable member of an electronic musical instrument. The apparatus has superior mechanical durability compared to displacement sensors of the past and can withstand long-term use. The apparatus includes a sensor that provides a detectable electrical characteristic having a value and a spring that, when compressed upon displacement of the movable member acts with the sensor, causing the value of the electrical characteristic to change. The value of the electrical characteristic represents the amount of displacement of the movable member and is used by a controller of the electronic musical instrument.
25 Citations
19 Claims
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1. A sensor device operable with a force applying member, the sensor device comprising:
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a substrate including a base material on which a first metal pattern and a second metal pattern are disposed; and a base film, located at least partially between the force applying member and the substrate, comprising; a resistive pattern; and a spacer film having one or more openings in a first area between a first part of the resistive pattern and the first metal pattern and in a second area between a second part of the resistive pattern and the second metal pattern; wherein the base film is configured to receive a force from the force applying member to cause at least a portion of the first part of the resistive pattern to contact at least a portion of the first metal pattern and to cause at least a portion of the second part of the resistive pattern to contact at least a portion of the second metal pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for operating a sensor device, the sensor device including a substrate having a base material on which a first metal pattern and a second metal pattern are disposed, and a base film having a resistive pattern, the method comprising:
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supplying a current to the first metal pattern; and receiving a force by the base film to cause at least a portion of a first part of the resistive pattern to contact the first metal pattern and at least a portion of a second part of the resistive pattern to contact the second metal pattern; wherein, in a case where at least the portion of the first part of the resistive pattern is in contact with the first metal pattern and at least the portion of the second part of the resistive pattern is in contact with the second metal pattern, the current is enabled to flow from the first metal pattern through the resistive pattern to the second metal pattern; wherein said receiving the force comprises receiving the force by the base film from a spring having a conical shape to cause at least the portion of the first part of the resistive pattern to contact the first metal pattern and at least the portion of the second part of the resistive pattern to contact the second metal pattern; and wherein, when the spring is being compressed, an increasing portion of the spring presses on the base film to cause an increasing portion of the first part of the resistive pattern to contact the first metal pattern and to cause an increasing portion of the second part of the resistive pattern to contact the second metal pattern. - View Dependent Claims (11, 12, 13)
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14. A method for operating a sensor device, the sensor device including a substrate having a base material on which a first metal pattern and a second metal pattern are disposed, and a base film having a resistive pattern, the method comprising:
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supplying a current to the first metal pattern; and receiving a force by the base film to cause at least a portion of a first part of the resistive pattern to contact the first metal pattern and at least a portion of a second part of the resistive pattern to contact the second metal pattern; wherein, in a case where at least the portion of the first part of the resistive pattern is in contact with the first metal pattern and at least the portion of the second part of the resistive pattern is in contact with the second metal pattern, the current is enabled to flow from the first metal pattern through the resistive pattern to the second metal pattern; providing, by the resistive pattern, an electrical resistance between the first metal pattern and the second metal pattern when the current is supplied to the first metal pattern and the base film receives the force; said receiving the force, comprising receiving the force by the base film from a spring having a conical shape to cause at least the portion of the first part of the resistive pattern to contact the first metal pattern and at least the portion of the second part of the resistive pattern to contact the second metal pattern; wherein, when the spring is being compressed, an increasing portion of the spring presses on the base film to cause an increasing portion of the first part of the resistive pattern to contact the first metal pattern and to cause an increasing portion of the second part of the resistive pattern to contact the second metal pattern; and wherein a value of the electrical resistance provided by the resistive pattern decreases as more of the first part of the resistive pattern contacts the first metal pattern and as more of the second part of the resistive pattern contacts the second metal pattern.
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15. A method for operating a sensor device, the sensor device including a substrate having a base material on which a first metal pattern and a second metal pattern are disposed, and a base film having a resistive pattern, the method comprising:
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supplying a current to the first metal pattern; and receiving a force by the base film to cause at least a portion of a first part of the resistive pattern to contact the first metal pattern and at least a portion of a second part of the resistive pattern to contact the second metal pattern; wherein, in a case where at least the portion of the first part of the resistive pattern is in contact with the first metal pattern and at least the portion of the second part of the resistive pattern is in contact with the second metal pattern, the current is enabled to flow from the first metal pattern through the resistive pattern to the second metal pattern; said base film including a spacer film, said spacer film having one or more openings in a first area between the first part of the resistive pattern and the first metal pattern and in a second area between the second part of the resistive pattern and the second metal pattern; wherein said receiving the force comprises receiving the force by the base film to cause at least the portion of the first part of the resistive pattern to pass through at least one of the one or more openings in the spacer film to contact the first metal pattern and to cause at least the portion of the second part of the resistive pattern to pass through at least one of the one or more openings in the spacer film to contact the second metal pattern.
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16. An electronic musical instrument, comprising:
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a pedal; and a sensor device, comprising; a substrate including a base material on which a first metal pattern and a second metal pattern are disposed; and a base film, comprising; a resistive pattern; and a spacer film having one or more openings in a first area between a first part of the resistive pattern and the first metal pattern and in a second area between a second part of the resistive pattern and the second metal pattern; said base film configured to receive a force when the pedal is depressed to cause at least a portion of the first part of the resistive pattern to contact at least a portion of the first metal pattern and to cause at least a portion of the second part of the resistive pattern to contact at least a portion of the second metal pattern. - View Dependent Claims (17, 18, 19)
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Specification