Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same
First Claim
1. A low-emissivity coating on a substrate, the coating comprising, in order outward from the substrate:
- a) a first dielectric layer;
b) a first Ag layer;
c) a first barrier layer comprising an oxide of nickel and/or chromium, wherein the first barrier layer comprises about 15 to 60 atomic percent oxygen;
d) a first absorbing layer comprising nickel and/or chromium;
e) a second dielectric layer;
f) a second Ag layer;
g) a second absorbing layer;
i) a third dielectric layer; and
j) optionally, a topcoat layer,wherein the first barrier layer is in direct contact with the first Ag layer,the first absorbing layer is in direct contact with the first barrier layer and either the first absorbing layer or the second absorbing layer is optional.
4 Assignments
0 Petitions
Accused Products
Abstract
The invention provides low-emissivity stacks comprising at least one absorbing layer, said stacks being characterized by a low solar heat gain coefficient (SHGC), enhanced aesthetics, mechanical and chemical durability, and a tolerance for tempering or heat strengthening. The invention moreover provides low-emissivity coatings comprising, in order outward from the substrate a first dielectric layer, a first Ag layer; a first barrier layer; a first absorbing layer; a second dielectric layer; a second Ag layer; a second absorbing layer; a third dielectric layer; and optionally, a topcoat layer, and methods for depositing such coatings on substrates.
-
Citations
67 Claims
-
1. A low-emissivity coating on a substrate, the coating comprising, in order outward from the substrate:
-
a) a first dielectric layer; b) a first Ag layer; c) a first barrier layer comprising an oxide of nickel and/or chromium, wherein the first barrier layer comprises about 15 to 60 atomic percent oxygen; d) a first absorbing layer comprising nickel and/or chromium; e) a second dielectric layer; f) a second Ag layer; g) a second absorbing layer; i) a third dielectric layer; and j) optionally, a topcoat layer, wherein the first barrier layer is in direct contact with the first Ag layer, the first absorbing layer is in direct contact with the first barrier layer and either the first absorbing layer or the second absorbing layer is optional. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55)
-
-
56. A low-emissivity coating on a substrate, the coating comprising, in order outward from the substrate:
-
a) a first dielectric layer having a thickness up to about 25 nm; b) a first Ag layer having a thickness of about 8 nm to about 15 nm; c) a first barrier layer comprising of an oxide of nickel and/or chromium, wherein the first barrier layer comprises about 15 to 60 atomic percent oxygen and having a thickness of about 0.1 nm to about 4 nm; d) a first absorbing layer comprising nickel and/or chromium and having a thickness of about 0.2 nm to about 8 nm; e) a second dielectric layer having a thickness of about 40 nm to about 75 nm; f) a second Ag layer having a thickness of about 8 nm to about 15 nm; g) a second absorbing layer having a thickness of about 0.1 nm to about 8 nm; h) a third dielectric layer having a thickness of about 10 nm to about 40 nm; and i) optionally, a topcoat layer and, wherein the first barrier layer is in direct contact with the first Ag layer and the first absorbing layer is in direct contact with the first barrier layer. - View Dependent Claims (57, 58, 59, 60, 61, 62)
-
-
63. A low-emissivity coating on a substrate, the coating comprising, in order outward from the substrate:
-
a) a first dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum and having a thickness of about 3 nm to about 30 nm; b) a first nucleation layer comprising an oxide of zinc and/or aluminum and having a thickness of about 3 nm to about 11 nm; c) a first Ag layer having a thickness of about 8 nm to about 12 nm; d) a first barrier layer comprising an oxide of nickel and/or chromium and having a thickness of about 0.8 nm to about 2 nm wherein the first barrier layer comprises about 15 to 60 atomic percent oxygen; e) a first absorbing layer comprising NiCr and having a thickness of about 1.5 nm to about 4 nm; f) a second dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum and having a thickness of about 55 nm to about 75 nm; g) a second nucleation layer comprising an oxide of zinc and/or aluminum and having a thickness of about 3 nm to about 10 nm; h) a second Ag layer having a thickness of about 10 nm to about 15 nm; i) a second absorbing layer comprising NiCr and having a thickness of about 0.1 nm to about 2.2 nm; j) a third dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum and having a thickness of about 24 nm to about 40 nm; and k) optionally, a topcoat layer and, wherein the first barrier layer is in direct contact with the first Ag layer and the first absorbing layer is in direct contact with the first barrier layer. - View Dependent Claims (64, 65, 66)
-
-
67. A low-emissivity coating on a substrate, the coating comprising, in order outward from the substrate:
-
a) a first dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum; b) a first nucleation layer comprising an oxide of zinc and/or aluminum; c) a first Ag layer; d) a first barrier layer comprising an oxide of nickel and/or chromium wherein the first barrier layer comprises about 15 to 60 atomic percent oxygen; e) a first absorbing layer comprising NiCr metal; f) a second dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum; g) a second nucleation layer comprising an oxide of zinc and/or aluminum; h) a second Ag layer; i) a second absorbing layer comprising NiCr metal; j) a third dielectric layer comprising an oxide or oxynitride of silicon and/or aluminum; and k) optionally, a topcoat layer, wherein the first barrier layer is in direct contact with the first Ag layer and the first absorbing layer is in direct contact with the first barrier layer.
-
Specification