Apparatus and method for controlled particle beam manufacturing
First Claim
1. A method of implanting particles into a workpiece, the method comprising:
- forming a digital beam comprising a steady stream of pulsed charged particles where the travel of each pulse is temporally synchronized with geometry of a deflector for deflecting each pulse resulting in independent control of each pulse; and
independently directing the each pulse towards the workpiece in an exposure chamber.
5 Assignments
0 Petitions
Accused Products
Abstract
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
-
Citations
28 Claims
-
1. A method of implanting particles into a workpiece, the method comprising:
forming a digital beam comprising a steady stream of pulsed charged particles where the travel of each pulse is temporally synchronized with geometry of a deflector for deflecting each pulse resulting in independent control of each pulse; and
independently directing the each pulse towards the workpiece in an exposure chamber.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
-
16. A method of implanting at least one dopant into a workpiece, the method comprising:
-
forming a beam comprising at least one ion species; altering at least a spacing between ions in the beam so as to convert the beam into a digital beam; and
exposing the digital beam onto the workpiece. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
-
-
27. A method of processing to implant particles into a workpiece, the method comprising:
-
forming a digital beam comprising said particles; adjusting a spacing of said particles to conform to a geometry of deflector; and directing the digital beam towards the workpiece on a movable stage in an exposure chamber.
-
-
28. A method of implanting at least one dopant into a workpiece, the method comprising:
-
directing a digital beam comprising at least one ion species onto the workpiece; and during the directing, altering at least one parameter of the digital beam to conform to a parameter of a deflector for deflecting the ions species.
-
Specification