Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator
First Claim
1. A method for fabricating an interferometric light modulating device, comprising:
- forming a conductive reflective layer;
forming a dielectric layer over the reflective layer;
adding a charged species to the dielectric layer; and
subsequently forming a conductive partly-transmissive and partly-reflective layer over the dielectric layer.
3 Assignments
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Accused Products
Abstract
By varying the spacing between a partially-reflective, partially-transmissive surface and a highly reflective surface positioned behind the partially-reflective, partially-transmissive surface, an interferometric modulator selectively creates constructive and/or destructive interference between light waves reflecting off the two surfaces. The spacing can be varied by applying a voltage to create electrostatic attraction between the two surfaces, which causes one or both surfaces to deform and move closer together. In the absence of such attraction, the surfaces are in a relaxed position, where they are farther apart from one another. A actuation voltage is needed to create sufficient electrostatic attraction to cause a surface to deform. The actuation voltage can be modified by implanting ions in a dielectric layer attached to one or both surfaces. Upon the application of a voltage, the ions create a baseline level of repulsion or attraction between the two surfaces, which thus require more or less voltage, respectively, to cause a surface to deform. The degree of ion implantation can be chosen to set the actuation voltage as desired, or the surfaces can be made to deform at a given voltage by appropriately selecting the degree of ion implantation.
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Citations
15 Claims
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1. A method for fabricating an interferometric light modulating device, comprising:
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forming a conductive reflective layer; forming a dielectric layer over the reflective layer; adding a charged species to the dielectric layer; and subsequently forming a conductive partly-transmissive and partly-reflective layer over the dielectric layer. - View Dependent Claims (4, 5, 10)
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2. A method for fabricating an interferometric light modulating device, comprising:
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forming a conductive reflective layer; forming a dielectric layer over the reflective layer; adding a charged species to the dielectric layer, wherein adding the charged species comprises performing an ion implantation after forming the dielectric layer; and forming a conductive partly-transmissive and partly-reflective layer over the dielectric layer. - View Dependent Claims (3)
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6. A method for fabricating an interferometric light modulating device, comprising:
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forming a conductive reflective layer; forming a dielectric layer over the reflective layer; adding a charged species to the dielectric layer, wherein adding the charged species comprises doping the dielectric layer; and forming a conductive partly-transmissive and partly-reflective layer over the dielectric layer. - View Dependent Claims (7, 8, 9)
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11. A method for fabricating an interferometric light modulating device, comprising:
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forming a conductive reflective layer; forming a dielectric layer over the reflective layer, wherein forming the dielectric layer comprises depositing an oxide; adding a charged species to the dielectric layer; and forming a conductive partly-transmissive and partly-reflective layer over the dielectric layer. - View Dependent Claims (12, 13, 14, 15)
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Specification