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Decal transfer lithography

  • US 7,662,545 B2
  • Filed: 10/14/2004
  • Issued: 02/16/2010
  • Est. Priority Date: 10/14/2004
  • Status: Active Grant
First Claim
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1. A method of making a microstructure, comprising:

  • selectively activating an exposed portion of a surface of a silicon-containing elastomer by irradiating the exposed portion with UV radiation through a mask, while covering a protected portion of the surface with the mask,where during the irradiating the exposed portion is in contact with an atmosphere containing oxygen, and the mask is in contact with the protected portion;

    removing the mask from the surface of the silicon-containing elastomer;

    contacting the surface of the silicon-containing elastomer with a substrate; and

    bonding the activated portion and the substrate, such that the activated portion and a portion of the substrate in contact with the activated portion are irreversibly attached.

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