Decal transfer lithography
First Claim
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1. A method of making a microstructure, comprising:
- selectively activating an exposed portion of a surface of a silicon-containing elastomer by irradiating the exposed portion with UV radiation through a mask, while covering a protected portion of the surface with the mask,where during the irradiating the exposed portion is in contact with an atmosphere containing oxygen, and the mask is in contact with the protected portion;
removing the mask from the surface of the silicon-containing elastomer;
contacting the surface of the silicon-containing elastomer with a substrate; and
bonding the activated portion and the substrate, such that the activated portion and a portion of the substrate in contact with the activated portion are irreversibly attached.
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Abstract
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
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Citations
33 Claims
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1. A method of making a microstructure, comprising:
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selectively activating an exposed portion of a surface of a silicon-containing elastomer by irradiating the exposed portion with UV radiation through a mask, while covering a protected portion of the surface with the mask, where during the irradiating the exposed portion is in contact with an atmosphere containing oxygen, and the mask is in contact with the protected portion; removing the mask from the surface of the silicon-containing elastomer; contacting the surface of the silicon-containing elastomer with a substrate; and bonding the activated portion and the substrate, such that the activated portion and a portion of the substrate in contact with the activated portion are irreversibly attached. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 30, 31, 32, 33)
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12. A method of selectively activating a surface, comprising:
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positioning a mask on a surface of a silicon-containing elastomer; the mask comprising a pattern of UV-opaque portions and UV-transparent portions, and comprising a spacer material under the UV-opaque portions; the surface comprising an exposed portion below and spaced apart from the UV-transparent portions, and a protected portion covered with the mask; irradiating the exposed portion of the surface with UV radiation; and contacting the exposed portion with an atmosphere enriched in molecular oxygen or ozone during the irradiation; where the mask is in contact with the protected portion during the irradiating. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29)
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Specification