System to transfer a template transfer body between a motion stage and a docking plate

• US 7,665,981 B2
• Filed: 08/25/2005
• Issued: 02/23/2010
• Est. Priority Date: 08/25/2005
• Status: Active Grant

• Current Assignee: Mii Newco, Inc.
• Original Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Inventors: Kim, Jae H., Babbs, Daniel A., Schumaker, Philip D., Choi, Byung-Jin, Fancello, Angelo
• Primary Examiner(s): EWALD, MARIA VERONICA
• Application Number:
  US11/211,766
• Publication Number:
  US 20070071582A1
• Time in Patent Office: 1,643 Days
• Field of Search: 425/385, 264/293
• US Class Current: 425/385
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details

Abstract

The present is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.

Claims

1. A transfer system of an imprint lithography system, the imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate, comprising:

a docking system positioned on a stage support of the imprint lithography system;

a motion stage having a substrate chuck for holding said substrate, said motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and

a body positioned on said stage support of said imprint lithography system, having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a probability of a collision between any of said docking system, said motion stage, and said body while transferring said body between said docking system and said motion stage, said body having at least one component device positioned thereon.

2. The system as recited in claim 1 wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm being in communication with a motor to position said docking plate a third distance from said docking body, with said third distance being a difference between said first and second distances.

4. The system as recited in claim 1 wherein said body comprises a latching system having first and second latches, wherein said first latch selectively couples said body to said docking system and said second latch selectively couples said body to said motion stage.

5. The system as recited in claim 1 wherein said system further includes a coupling source coupled to said body, with said coupling source selected from a group of coupling sources comprising a pump system and a voltage source.

6. The system as recited in claim 1 wherein said component device includes a template holder capable of holding said imprint lithography template.

7. The system as recited in claim 1 wherein said component device includes a detection system to determine a presence and a position of said imprint lithography template.

8. The system as recited in claim 1 wherein said motion stage comprises a coupling element selected from a group of coupling elements comprising a flat and a vee.

9. The system as recited in claim 1, wherein said body further includes a component that may interact with said docking system, said motion stage, or said body to produce a desired result.

22. The system as recited in claim 1 wherein the component device is an optical detection system.

23. The system as recited in claim 22 wherein said optical detection system includes a microscope and said optical detection system is capable of locating said imprint lithography template within said imprint lithography system.

3. A transfer system of an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate comprising:

a docking system, said docking system positioned on a stage support of said imprint lithography system;

a motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and

a body positioned on said stage support of said imprint lithography system and having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a probability of a collision between any of said docking system, said motion stage, and said body while transferring said body between said docking system and said motion stage, wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm having an additional range of motion associated therewith, with a periphery of said additional range of motion being spaced-apart from said docking system a third distance, with said third distance being a difference between said first and second distances.

10. A transfer system for use in an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate comprising:

a docking system positioned on a stage support;

a motion stage positioned on said stage support and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and

a body positioned on a stage support, having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a kinetic energy present while transferring said body between said docking system and said motion stage, said body having at least one component device positioned thereon for use in said imprint lithography system.

11. The system as recited in claim 10 wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm being in communication with a motor to position said docking plate a third distance from said docking body, with said third distance being a difference between said first and second distances.

13. The system as recited in claim 10 wherein said body comprises a latching system having first and second latches, wherein said first latch couples said body to said docking system and said second latch couples said body to said motion stage.

14. The system as recited in claim 10 wherein said system further includes a coupling source coupled to said body, with said coupling source selected from a group of coupling sources comprising a pump system and a voltage source.

15. The system as recited in claim 10 wherein said motion stage comprises a coupling element selected from a group of coupling elements comprising a flat and a vee.

12. A transfer system of an imprint lithography system, said imprint lithography system operable for imprinting a pattern into a material deposited between an imprint template and a substrate comprising:

a docking system, said docking system positioned on a stage support of said imprint lithography system;

a motion stage positioned on said stage support of said imprint lithography system and spaced-apart from said docking system a first distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said first distance; and

a body positioned on said stage support of said imprint lithography system and having first and second opposed sides spaced-apart a second distance, selectively coupled between said docking system and said motion stage, with said first distance being greater than said second distance to minimize a kinetic energy present while transferring said body between said docking system and said motion stage, wherein said docking system comprises a docking body and a docking plate having an arm coupled therebetween, said arm having an additional range of motion associated therewith, with a periphery of said additional range of motion being spaced-apart from said docking system a third distance, with said third distance being a difference between said first and second distances.

16. An imprint lithography system comprising:

a docking system positioned on a stage support, said docking system comprising a docking body and a docking plate having an arm coupled therebetween, said arm in communication with a motor to position said docking plate between first and second positions, said second position being spaced-apart from said docking body a first distance;

a motion stage positioned on said stage support and spaced-apart from said docking system a second distance, said motion stage having a range of motion associated therewith, with a periphery of said range of motion being spaced-apart from said docking system said second distance; and

a body positioned on said stags support and selectively coupled between said docking system and said motion stage, with said first and second distances being established to minimize a probability of a collision between any of said docking system, said motion stage and said body while transfening said body between said docking system and said motion stage, said body having a component device positioned thereon for use in said imprint lithography system.

17. The system as recited in claim 16 wherein said arm has an additional range of motion associated therewith, with a periphery of said additional range of motion being spaced-apart from said docking system said first distance.

18. The system as recited in claim 16 wherein said body comprises a latching system having first and second latches, wherein said first latch couples said body to said docking system and said second latch couples said body to said motion stage.

19. The system as recited in claim 16 wherein said system further includes a coupling source coupled to said body, with said coupling source selected from a group of coupling sources comprising a pump system and a voltage source.

20. The system as recited in claim 16 wherein said component device comprises a detection system to determine a presence and a position of a template.

21. The system recited in claim 16 wherein said motion stage comprises a coupling element selected from a group of coupling elements comprising a fiat and a vee.