Optical diffusers, photomasks and their methods of fabrication

• US 7,670,726 B2
• Filed: 07/20/2006
• Issued: 03/02/2010
• Est. Priority Date: 07/20/2006
• Status: Expired due to Fees

• Current Assignee: Zhijian Lu
• Original Assignee: Zhijian Lu
• Inventors: Lu, Zhijian
• Primary Examiner(s): Huff; Mark F
• Assistant Examiner(s): Fraser; Stewart A
• Application Number:
  US11/489,715
• Publication Number:
  US 20080020291A1
• Time in Patent Office: 1,321 Days
• Field of Search: 430/5, 430/311, 430/321, 430/394, 430/396, 716/19, 716/21
• US Class Current: 430/5
• CPC Class Codes: G02B 1/12 by surface treatment, e.g. by irradiation
• CPC Class Codes: G02B 5/0215 the surface having a regular structure
• CPC Class Codes: G02B 5/0221 the surface having an irregular structure G02B5/0226 takes precedence
• CPC Class Codes: G02B 5/0231 the surface having microprismatic or micropyramidal shape macroscopic prism arrays G02B5/045
• CPC Class Codes: G02B 5/0268 characterized by the fabrication or manufacturing method
• CPC Class Codes: G02B 5/0278 used in transmission
• CPC Class Codes: G02B 6/0051 Diffusing sheet or layer
• CPC Class Codes: G02F 1/133606 including a specially adapted diffusing, scattering or light controlling members
• CPC Class Codes: G03F 1/00 Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
• CPC Class Codes: G03F 7/0007 Filters, e.g. additive colour filters; Components for display devices

Abstract

A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.

Claims

1. A photomask comprising:

a mask having a plurality of cell mask areas, the cell mask areas disposed in an XY matrix;

wherein all of the cell mask areas have a substantially identical pattern of randomly placed transmissive apertures, and the photomask, viewed as a whole, appears macroscopically uniform and without an apparent grid pattern.

2. The photomask according to claim 1, wherein, within each of the plurality of cell mask areas, positions of the transmissive apertures in the substantially identical pattern of transmissive apertures correspond to a pattern of locations which are perturbed from a non-random pattern of locations at each location in a random direction and by a random distance where the random distance is no more than a maximum distance.

3. The photomask according to claim 1, wherein each of the transmissive apertures have a center, and the centers of the transmissive apertures of the substantially identical pattern of transmissive apertures are separated from each other by at least a minimum distance.

4. The photomask according to claim 3, wherein the minimum distance is selected such that adjacent transmissive apertures can overlap each other.

5. The photomask according to claim 3, wherein the minimum distance is selected such that adjacent transmissive apertures cannot overlap each other.

11. The photomask according to claim 1, wherein, within each of the plurality of cell mask areas, positions of the transmissive apertures correspond to a random pattern of locations having centers with a minimum distance from each other and from apertures in adjacent cell mask areas and any opposing cell mask areas.

6. A method of fabricating a photomask comprising:

generating a plurality of cell mask areas, each cell mask area having transmissive apertures, all of the cell mask areas having a substantially identical pattern of randomly placed transmissive apertures;

positioning the generated cell mask areas in an XY matrix; and

forming the transmissive apertures patterns in the photomask;

wherein the photomask, viewed as a whole, appears macroscopically uniform and without an apparent grid pattern.

7. The method according to claim 6, wherein in the step of generating a plurality of cell mask areas, the transmissive apertures are generated from a non-random pattern of locations which are then perturbed at each location in a random direction and by a random distance where the random distance is no more than a maximum distance.

8. The method according to claim 6, wherein in the step of generating a plurality of cell mask areas, the transmissive apertures are positioned such that the transmissive apertures are separated from each other by at least a minimum distance.

9. The method according to claim 8, wherein the minimum distance is selected such that adjacent transmissive apertures can overlap each other.

10. The method according to claim 8, wherein the minimum distance is selected such that adjacent transmissive apertures cannot overlap each other.

12. A method of fabricating a photomask comprising the steps of:

a) generating a cell mask area having a pattern of transmissive apertures randomly placed, each transmissive aperture having a center;

b) removing a transmissive aperture from the cell mask area if the transmissive aperture is spaced from adjacent transmissive apertures by less than a minimum amount;

c) removing a transmissive aperture from the cell mask area if the transmissive aperture is not spaced from transmissive apertures along opposing boundaries of the cell mask area by at least the minimum amount; and

d) forming the pattern of transmissive apertures in the photomask;

wherein the photomask, viewed as a whole, appears macroscopically uniform.

13. The method of claim 12, further comprising the steps of:

adding an additional randomly placed transmissive aperture to the cell mask area for each transmissive aperture removed in step b); and

repeating step b).

14. The method of claim 13, further comprising the steps of:

adding an additional randomly placed transmissive aperture to the cell mask area for each transmissive aperture removed in step c); and

repeating step c).

15. A method of fabricating a photomask comprising the steps of:

a) generating a cell mask area having a pattern of transmissive apertures randomly placed, each transmissive aperture having a center;

b) removing a transmissive aperture from the cell mask area if the transmissive aperture is spaced from adjacent transmissive apertures by less than a minimum amount;

c) replicating the cell mask area and placing the replicated cell mask areas in an XY matrix;

d) removing a transmissive aperture from at least one cell mask area if the transmissive aperture is spaced from transmissive apertures in adjacent cell mask areas and opposing cell mask areas, if any, by less than the minimum amount; and

e) forming the pattern of transmissive apertures in the photomask;

wherein the photomask, viewed as a whole, appears macroscopically uniform.

16. The method of claim 15, further comprising the steps of:

adding an additional randomly placed transmissive aperture to the cell mask area for each transmissive aperture removed in step b); and

repeating step b).

17. The method of claim 16, further comprising the steps of:

adding an additional randomly placed transmissive aperture to the cell mask area for each transmissive aperture removed in step d); and

repeating step d).

18. The method of claim 15, further comprising the step of:

f) removing transmissive apertures in other cell mask areas corresponding to the transmissive aperture removed in step d).

19. The method of claim 18, further comprising the steps of:

adding an additional randomly placed transmissive aperture to the cell mask area having a transmissive aperture removed in step f);

replicating the added additional randomly placed transmissive aperture to the other cell mask areas having a transmissive aperture removed in step f); and

repeating steps d) and f).