Fabrication of a high fill ratio silicon spatial light modulator
First Claim
1. A method of forming a composite substrate structure, the method comprising:
- providing a substrate comprising a plurality of electrode devices and a bias grid;
forming a planarized dielectric layer over the substrate, the planarized dielectric layer defining an upper surface opposing the substrate;
forming a cavity extending from the upper surface of the planarized dielectric layer to a predetermined depth, wherein a cavity volume is defined by a cavity area parallel to the upper surface of the planarized dielectric layer and the predetermined depth;
joining a single crystal silicon layer to the upper surface of the planarized dielectric layer to define a bonded area greater than the cavity area.
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Accused Products
Abstract
A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300 ° C. to maintain a state of the planarizing material.
25 Citations
23 Claims
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1. A method of forming a composite substrate structure, the method comprising:
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providing a substrate comprising a plurality of electrode devices and a bias grid; forming a planarized dielectric layer over the substrate, the planarized dielectric layer defining an upper surface opposing the substrate; forming a cavity extending from the upper surface of the planarized dielectric layer to a predetermined depth, wherein a cavity volume is defined by a cavity area parallel to the upper surface of the planarized dielectric layer and the predetermined depth; joining a single crystal silicon layer to the upper surface of the planarized dielectric layer to define a bonded area greater than the cavity area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification