×

Process for manufacturing a membrane of semiconductor material integrated in, and electrically insulated from, a substrate

  • US 7,678,600 B2
  • Filed: 03/13/2008
  • Issued: 03/16/2010
  • Est. Priority Date: 03/14/2007
  • Status: Active Grant
First Claim
Patent Images

1. A process for manufacturing an insulated membrane made of semiconductor material, comprising:

  • forming, in a monolithic body of semiconductor material having a front face, a buried cavity extending at a distance from said front face and delimiting with said front face a surface region of said monolithic body, said surface region forming a membrane that is suspended above said buried cavity;

    forming an insulation structure in a surface portion of said monolithic body such as to electrically insulate said membrane from said monolithic body; and

    setting said insulation structure at a distance from said membrane so that said insulation structure is positioned outside, and at a non-zero distance of separation from said membrane.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×