Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber

• US 7,679,024 B2
• Filed: 12/23/2005
• Issued: 03/16/2010
• Est. Priority Date: 12/23/2005
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Wang, Ing-Yann Albert, Kamarehi, Mohammad
• Primary Examiner(s): Ralis; Stephen J
• Application Number:
  US11/317,961
• Publication Number:
  US 20070145021A1
• Time in Patent Office: 1,544 Days
• Field of Search: 118/723.MW, 118/723.ME, 118/723.M, 118/723.MR, 156/345.35, 156/345.66, 156/345.41, 156/345.65, 219/695, 219/696, 219/121.4, 219/121.41, 219/121.48, 219/659, 204/298
• US Class Current: 219/121.43
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32449 Gas control, e.g. control of the gas flow

Abstract

A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber. The plasma tube has a top end. The arrangement includes a body having a first end. The first end has a width larger than the plasma tube and a protrusion end adapted to be inserted into the top end. The arrangement also includes a gas inlet vertically disposed in the body. The gas inlet extends from the first end toward the protrusion end and the gas inlet terminates before extending through the protrusion end. The arrangement further includes a plurality of directional inlet channels extending from a lower end of the gas inlet through the protrusion end.

Claims

1. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber for forming plasma inside said plasma tube such that said plasma tube contains said plasma, said plasma tube having a top end, said gas distribution arrangement comprising:

a body having a first element and a protrusion element, said first element being wider than said plasma tube, said first element being configured to be coupled with said plasma tube, said first element including a gas inlet for receiving said process gas, said first element further including a plurality of side channels, said protrusion element being adapted to be inserted into said top end;

a plurality of continuous channels extending from a side surface of said protrusion element to a bottom of said protrusion element, said side surface of said protrusion element facing an inner surface of said plasma tube and being parallel to said inner surface of said plasma tube, said inner surface of said plasma tube surrounding said protrusion element; and

an area disposed between said side surface of said protrusion element and said inner surface of said plasma tube, said plurality of side channels being configured to direct said process gas from said gas inlet to said area, said plurality of continuous channels being configured to direct said process gas from said area into said plasma tube.

2. The gas distribution arrangement of claim 1 wherein said area is surrounded by at least one o-ring, said area configured to receive said process gas for cooling said at least one o-ring.

3. The gas distribution arrangement of claim 2 wherein said protrusion element is dimensioned so as to minimize a gap between a wall of said protrusion element and a wall of said plasma tube.

4. The gas distribution arrangement of claim 1 wherein said body is formed of a material that includes aluminum.

5. The gas distribution arrangement of claim 1 wherein each continuous channel of said plurality of continuous channels is linear from said side surface of said protrusion element to said bottom of said protrusion element.

6. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber for forming plasma inside said plasma tube such that said plasma tube contains said plasma, said plasma tube having a top end and at least one o-ring surrounding said plasma tube proximate said top end, said gas distribution arrangement comprising:

a first element including a gas inlet for receiving said process gas, said first element further including a plurality of side channels, said first element being wider than said plasma tube, said first element being configured to be coupled with said plasma tube;

a protrusion element surrounded by at least a portion of said plasma tube, said protrusion element including at least a plurality of continuous channels extending from a side surface of said protrusion element to a bottom of said protrusion element, said side surface of said protrusion element facing an inner surface of said portion of said plasma tube and being parallel to said portion of said plasma tube; and

an area disposed between said side surface of said protrusion element and said inner surface of said portion of said plasma tube, said plurality of side channels being configured to direct said process gas from said gas inlet to said area, said plurality of continuous channels being configured to direct said process gas from said area into said plasma tube.

7. The gas distribution arrangement of claim 6 wherein a cross-sectional area of said gas inlet is less than a cross-sectional area of said plasma tube.

8. The gas distribution arrangement of claim 6 wherein said area is configured to receive said process for cooling at least an o-ring, said o-ring surrounding said area.

9. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber for forming plasma inside said plasma tube such that said plasma tube contains said plasma, said plasma tube having a top end and at least one o-ring surrounding said plasma tube proximate said top end, said gas distribution arrangement comprising:

a first element that is wider than said plasma tube and configured to be coupled with said plasma tube, said first element including a gas inlet and a plurality of side channels, said plurality of side channels extending from a section of a wall of said gas inlet toward a wall of said plasma tube, wherein said plurality of side channels is in communication with said gas inlet, wherein at least one of said side channels directs said process gas into an o-ring adjacent area of said wall of said plasma tube that is adjacent to said at least one o-ring;

a protrusion element surrounded by at least a portion of said wall of said plasma tube, said protrusion element including at least a plurality of continuous channels extending from a side surface of said protrusion element to a bottom of said protrusion element, said side surface of said protrusion element facing an inner surface of said wall of said plasma tube and being parallel to said wall of said plasma tube; and

an area disposed between said side surface of said protrusion element and said inner surface of said plasma tube, said plurality of side channels being configured to direct said process gas from said gas inlet to said area, said plurality of continuous channels being configured to direct said process gas from said area into said plasma tube.

10. The gas distribution arrangement of claim 9 wherein a sum of cross-sectional areas of said plurality of side channels is equal to or less than a cross-sectional of said plasma tube.

11. The gas distribution arrangement of claim 9 wherein a cross-sectional area of said gas inlet is less than said cross-sectional area of said plasma tube.

12. The gas distribution arrangement of claim 9 wherein said gas inlet and said side channels are disposed outside above said top end.

13. A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber for forming plasma inside said plasma tube such that said plasma tube contains said plasma, said plasma tube having a top end, said gas distribution arrangement comprising:

a body having a first element and a protrusion element, said first element being wider than said plasma tube, said first element being configured to be coupled with said plasma tube, said first element including a gas inlet for receiving said process gas, said first element further including a plurality of side channels, said protrusion element being adapted to be inserted into said top end, said plurality of side channels extending from a section of a wall of said gas inlet toward a wall of said plasma tube, said wall of said plasma tube being surrounded by at least one o-ring, said plurality of side channels configured to receive said gas from said gas inlet;

a plurality of continuous channels extending from a side surface of said protrusion element to a bottom of said protrusion element, said side surface of said protrusion element facing an inner surface of said wall of said plasma tube and being parallel to said inner surface of said wall of said plasma tube, said wall of said plasma tube surrounding said protrusion element; and

an area disposed between said side surface of said protrusion element and said inner surface of said plasma tube, said plurality of side channels being configured to direct said process gas from said gas inlet to said area, said plurality of continuous channels being configured to direct said process gas from said area into said plasma tube.

14. The gas distribution arrangement of claim 13 wherein said area is configured to receive said process gas for cooling said at least one o-ring.

15. The gas distribution arrangement of claim 13 wherein said protrusion element includes an upper section and a lower section, said upper section having a cross-sectional area less than a cross-sectional area of said lower section, said side surface of said protrusion element representing a side surface of said upper section.

16. The gas distribution arrangement of claim 15 wherein said protrusion element is dimensioned so as to minimize a gap between a wall of said lower section of said protrusion element and said wall of said plasma tube, said wall of said lower section of said protrusion element being parallel to said wall of said plasma tube.

17. The gas distribution arrangement of claim 15 wherein said area is disposed between a wall of said upper section of said protrusion element and said wall of said plasma tube.

18. The gas distribution arrangement of claim 13 wherein a sum of cross-sectional areas of said plurality of side channels is equal to or less than a cross-sectional area of said gas inlet.

19. The gas distribution arrangement of claim 13 wherein said gas inlet and said side channels are disposed outside said top end of said plasma tube.

20. The gas distribution arrangement of claim 13 wherein said cross-sectional area of said gas inlet is less than across-sectional area of said plasma tube.

21. The gas distribution arrangement of claim 13 wherein said sum of cross-sectional areas of said plurality of side channels is less than said cross-sectional area of said plasma tube.

22. The gas distribution arrangement of claim 13 wherein at least one of said plurality of side channels is configured to direct said process gas toward said o-ring adjacent area to create a cooling arrangement for said at least one o-ring.

23. The gas distribution arrangement of claim 13 wherein said body is formed of a material that includes aluminum.

24. The gas distribution arrangement of claim 13 wherein said body is formed of a material that includes ceramic.